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Materials And Processes For Next Generation Lithography

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Materials and Processes for Next Generation Lithography

Materials and Processes for Next Generation Lithography Book
Author : Anonim
Publisher : Elsevier
Release : 2016-11-08
ISBN : 0081003587
Language : En, Es, Fr & De

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Book Description :

As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. Assembles up-to-date information from the world’s premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation Includes information on processing and metrology techniques Brings together multiple approaches to litho pattern recording from academia and industry in one place

Materials and Processes for Next Generation Lithography

Materials and Processes for Next Generation Lithography Book
Author : Alex Robinson
Publisher : Elsevier
Release : 2016-09-01
ISBN : 9780081003541
Language : En, Es, Fr & De

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Book Description :

These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various communities to produce in one place a definitive description of the many approaches to lithography fabrication. Assembles up-to-date information from the world s premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigationIncludes information on processing and metrology techniquesBrings together multiple approaches to litho pattern recording from academia and industry in one place"

Micro and Nano Machining of Engineering Materials

Micro and Nano Machining of Engineering Materials Book
Author : Kaushik Kumar,Divya Zindani,Nisha Kumari,J. Paulo Davim
Publisher : Springer
Release : 2018-09-26
ISBN : 3319999001
Language : En, Es, Fr & De

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Book Description :

This book covers the recent developments in the production of micro and nano size products, which cater to the needs of the industry. The processes to produce the miniature sized products with unique characteristics are addressed. Moreover, their application in areas such as micro-engines, micro-heat exchangers, micro-pumps, micro-channels, printing heads and medical implants are also highlighted. The book presents such microsystem-based products as important contributors to a sustainable economy. The recent research in this book focuses on the development of new micro and nano manufacturing platforms while integrating the different technologies to manufacture the micro and nano components in a high throughput and cost effective manner. The chapters contain original theoretical and applied research in the areas of micro- and nano-manufacturing that are related to process innovation, accuracy, and precision, throughput enhancement, material utilization, compact equipment development, environmental and life-cycle analysis, and predictive modeling of manufacturing processes with feature sizes less than one hundred micrometers.

Fundamentals and Applications of Nano Silicon in Plasmonics and Fullerines

Fundamentals and Applications of Nano Silicon in Plasmonics and Fullerines Book
Author : Munir H. Nayfeh
Publisher : Elsevier
Release : 2018-06-29
ISBN : 0323480586
Language : En, Es, Fr & De

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Book Description :

Fundamentals and Applications of Nano Silicon in Plasmonics and Fullerines: Current and Future Trends addresses current and future trends in the application and commercialization of nanosilicon. The book presents current, innovative and prospective applications and products based on nanosilicon and their binary system in the fields of energy harvesting and storage, lighting (solar cells and nano-capacitor and fuel cell devices and nanoLEDs), electronics (nanotransistors and nanomemory, quantum computing, photodetectors for space applications; biomedicine (substance detection, plasmonic treatment of disease, skin and hair care, implantable glucose sensor, capsules for drug delivery and underground water and oil exploration), and art (glass and pottery). Moreover, the book includes material on the use of advanced laser and proximal probes for imaging and manipulation of nanoparticles and atoms. In addition, coverage is given to carbon and how it contrasts and integrates with silicon with additional related applications. This is a valuable resource to all those seeking to learn more about the commercialization of nanosilicon, and to researchers wanting to learn more about emerging nanosilicon applications. Features a variety of designs and operation of nano-devices, helping engineers to make the best use of nanosilicon Contains underlying principles of how nanomaterials work and the variety of applications they provide, giving those new to nanosilicon a fundamental understanding Assesses the viability of various nanoslicon devices for mass production and commercialization, thereby providing an important source of information for engineers

Electronics

Electronics Book
Author : Michael Olorunfunmi Kolawole
Publisher : CRC Press
Release : 2020-06-15
ISBN : 1000089061
Language : En, Es, Fr & De

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Book Description :

This book gives clear explanations of the technical aspects of electronics engineering from basic classical device formulations to the use of nanotechnology to develop efficient quantum electronic systems. As well as being up to date, this book provides a broader range of topics than found in many other electronics books. This book is written in a clear, accessible style and covers topics in a comprehensive manner. This book’s approach is strongly application-based with key mathematical techniques introduced, helpful examples used to illustrate the design procedures, and case studies provided where appropriate. By including the fundamentals as well as more advanced techniques, the author has produced an up-to-date reference that meets the requirements of electronics and communications students and professional engineers. Features Discusses formulation and classification of integrated circuits Develops a hierarchical structure of functional logic blocks to build more complex digital logic circuits Outlines the structure of transistors (bipolar, JFET, MOSFET or MOS, CMOS), their processing techniques, their arrangement forming logic gates and digital circuits, optimal pass transistor stages of buffered chain, sources and types of noise, and performance of designed circuits under noisy conditions Explains data conversion processes, choice of the converter types, and inherent errors Describes electronic properties of nanomaterials, the crystallites’ size reduction effect, and the principles of nanoscale structure fabrication Outlines the principles of quantum electronics leading to the development of lasers, masers, reversible quantum gates, and circuits and applications of quantum cells and fabrication methods, including self-assembly (quantum-dot cellular automata) and tunneling (superconducting circuits), and describes quantum error-correction techniques Problems are provided at the end of each chapter to challenge the reader’s understanding

Drug Delivery Devices and Therapeutic Systems

Drug Delivery Devices and Therapeutic Systems Book
Author : Eric Chappel
Publisher : Academic Press
Release : 2020-11-07
ISBN : 0128198397
Language : En, Es, Fr & De

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Book Description :

Drug Delivery Devices and Therapeutic Systems examines the current technology and innovations moving drug delivery systems (DDS) forward. The book provides an overview on the therapeutic use of drug delivery devices, including design, applications, and a description of the design of each device. While other books focus on the therapy, the primary emphasis in this book is on current technologies for DDS applications, including microfluidics, nanotechnology, biodegradable hydrogel and microneedles, with a special emphasis on wearable DDS. As part of the Developments in Biomedical Engineering and Bioelectronics series, this book is written by experts in the field and informed with information directly from manufacturers. Pharmaceutical scientists, medical researchers, biomedical engineers and clinical professionals will find this an essential reference. Provides essential information on the most recent drug delivery systems available Explains current technology and its applications to drug delivery Contains contributions from biomedical engineers, pharmaceutical scientists and manufacturers

Introductory MEMS

Introductory MEMS Book
Author : Thomas M. Adams,Richard A. Layton
Publisher : Springer Science & Business Media
Release : 2009-12-08
ISBN : 038709511X
Language : En, Es, Fr & De

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Book Description :

Introductory MEMS: Fabrication and Applications is a practical introduction to MEMS for advanced undergraduate and graduate students. Part I introduces the student to the most commonly used MEMS fabrication techniques as well as the MEMS devices produced using these techniques. Part II focuses on MEMS transducers: principles of operation, modeling from first principles, and a detailed look at commercialized MEMS devices, in addition to microfluidics. Multiple field-tested laboratory exercises are included, designed to facilitate student learning about the fundamentals of microfabrication processes. References, suggested reading, review questions, and homework problems are provided at the close of each chapter. Introductory MEMS: Fabrication and Applications is an excellent introduction to the subject, with a tested pedagogical structure and an accessible writing style suitable for students at an advanced undergraduate level across academic disciplines.

Cluster Beam Deposition of Functional Nanomaterials and Devices

Cluster Beam Deposition of Functional Nanomaterials and Devices Book
Author : Paolo Milani
Publisher : Unknown
Release : 2020-03
ISBN : 0081025157
Language : En, Es, Fr & De

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Book Description :

Cluster Beam Deposition of Functional Nanomaterials and Devices, Volume 15, provides up-to-date information on the CBD of novel nanomaterials and devices. The book offers an overview of gas phase synthesis in a range of nanoparticles, along with discussions on the development of several devices and applications. Applications include, but are not limited to catalysis, smart nanocomposites, nanoprobes, electronic devices, gas sensors and biosensors. This is an important reference source for materials scientists and engineers who want to learn more about this sustainable, innovative manufacturing technology.

Nanoscale Electrochemistry

Nanoscale Electrochemistry Book
Author : Andrew J. Wain,Edmund J. F. Dickinson
Publisher : Elsevier
Release : 2021-09-24
ISBN : 0128200561
Language : En, Es, Fr & De

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Book Description :

Nanoscale Electrochemistry, Volume 20 focuses on the challenges and advances involved in electrochemical nanoscience at solid-liquid interfaces, highlighting the most recent developments. Nanotechnology has had a tremendous impact on the multidisciplinary field of electrochemistry, yielding new fundamental insights that have furthered our understanding of interfacial processes, thus stimulating new and diverse applications. Sections cover the principles of nanoscale electrochemical systems, emphasizing their unique behavior when compared to their macro/microscopic counterparts, present analytical applications such as sensing and bioelectrochemistry, and describe exciting, new “single entity based electrochemical methodologies that are specific to the nanoscale, including nanoparticle impacts and nanopore methods. The book's final three chapters address the rich overlap between electrochemistry and nanomaterials science, highlighting notable applications in energy conversion and storage. This is an important reference for those in both academia and industry who are seeking to learn more about how nanoscale electrochemistry has developed in recent years. Outlines the major applications of nanoscale electrochemistry in energy storage, spectroscopy and biology Summarizes the major principles of nanoscale electrochemical systems, exploring how they differ from similar system types Discusses the major challenges of electrochemical analysis at the nanoscale

Colloids for Nanobiotechnology

Colloids for Nanobiotechnology Book
Author : Wolfgang Parak,Neus Feliu
Publisher : Elsevier
Release : 2020-04-26
ISBN : 0081028296
Language : En, Es, Fr & De

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Book Description :

Colloids for Nanobiotechnology: Synthesis, Characterization and Potential Applications, Volume 17, offers a range of perspectives on emerging nano-inspired colloidal applications. With an emphasis on biomedical and environmental opportunities and challenges, the book outlines how nanotechnology is being used to increase the uses and impact of colloid science. Nanotechnology offers new horizons for colloidal research and synthesis routes that allow for the production of highly reproducible and defined materials. This book presents new characterization methods and a fundamental understanding of basic physicochemical, physical and chemical properties. Explores the use of nanotechnology in enhancing colloidal characterization techniques Explains how colloids are being used in a range of nanomedical applications Demonstrates how nanotechnology is being used to create more efficient colloidal synthesis techniques

Computational Modelling of Nanomaterials

Computational Modelling of Nanomaterials Book
Author : Panagiotis Grammatikopoulos
Publisher : Elsevier
Release : 2020-10-01
ISBN : 0128214988
Language : En, Es, Fr & De

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Book Description :

Due to their small size and their dependence on very fast phenomena, nanomaterials are ideal systems for computational modelling. This book provides an overview of various nanosystems classified by their dimensions: 0D (nanoparticles, QDs, etc.), 1D (nanowires, nanotubes), 2D (thin films, graphene, etc.), 3D (nanostructured bulk materials, devices). Fractal dimensions, such as nanoparticle agglomerates, percolating films and combinations of materials of different dimensionalities are also covered (e.g. epitaxial decoration of nanowires by nanoparticles, i.e. 0D+1D nanomaterials). For each class, the focus will be on growth, structure, and physical/chemical properties. The book presents a broad range of techniques, including density functional theory, molecular dynamics, non-equilibrium molecular dynamics, finite element modelling (FEM), numerical modelling and meso-scale modelling. The focus is on each method’s relevance and suitability for the study of materials and phenomena in the nanoscale. This book is an important resource for understanding the mechanisms behind basic properties of nanomaterials, and the major techniques for computational modelling of nanomaterials. Explores the major modelling techniques used for different classes of nanomaterial Assesses the best modelling technique to use for each different type of nanomaterials Discusses the challenges of using certain modelling techniques with specific nanomaterials

Nanostructured Thin Films

Nanostructured Thin Films Book
Author : Maria Benelmekki,Andreas Erbe
Publisher : Elsevier
Release : 2019-08-25
ISBN : 0081025734
Language : En, Es, Fr & De

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Book Description :

Nanostructured Thin Films: Fundamentals and Applications presents an overview of the synthesis and characterization of thin films and their nanocomposites. Both vapor phase and liquid phase approaches are discussed, along with the methods that are sufficiently attractive for large-scale production. Examples of applications in clean energy, sensors, biomedicine, anticorrosion and surface modification are also included. As the applications of thin films in nanomedicine, cell phones, solar cell-powered devices, and in the protection of structural materials continues to grow, this book presents an important research reference for anyone seeking an informed overview on their structure and applications. Shows how thin films are being used to create more efficient devices in the fields of medicine and energy harvesting Discusses how to alter the design of nanostructured thin films by vapor phase and liquid phase methods Explores how modifying the structure of thin films for specific applications enhances their performance

Computational Modelling of Nanoparticles

Computational Modelling of Nanoparticles Book
Author : Stefan T. Bromley,Scott M. Woodley
Publisher : Elsevier
Release : 2018-09-12
ISBN : 0081022751
Language : En, Es, Fr & De

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Book Description :

Computational Modelling of Nanoparticles highlights recent advances in the power and versatility of computational modelling, experimental techniques, and how new progress has opened the door to a more detailed and comprehensive understanding of the world of nanomaterials. Nanoparticles, having dimensions of 100 nanometers or less, are increasingly being used in applications in medicine, materials and manufacturing, and energy. Spanning the smallest sub-nanometer nanoclusters to nanocrystals with diameters of 10s of nanometers, this book provides a state-of-the-art overview on how computational modelling can provide, often otherwise unobtainable, insights into nanoparticulate structure and properties. This comprehensive, single resource is ideal for researchers who want to start/improve their nanoparticle modelling efforts, learn what can be (and what cannot) achieved with computational modelling, and understand more clearly the value and details of computational modelling efforts in their area of research. Explores how computational modelling can be successfully applied at the nanoscale level Includes techniques for the computation modelling of different types of nanoclusters, including nanoalloy clusters, fullerines and Ligated and/or solvated nanoclusters Offers complete coverage of the use of computational modelling at the nanoscale, from characterization and processing, to applications

Solvent based Development of Photoresists for Next generation Lithography

Solvent based Development of Photoresists for Next generation Lithography Book
Author : Christine Y. Ouyang
Publisher : Unknown
Release : 2013
ISBN : 0987650XXX
Language : En, Es, Fr & De

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Book Description :

As feature sizes continue to shrink, the need for new materials and new processes for next-generation lithography becomes more urgent. Although aqueous base development has been the industry standard for over twenty years, there are still several issues that need to be overcome. First, the high surface tension of aqueous base developers can lead to pattern collapse of high aspect ratio patterns and limit resolution. The toxicity of aqueous base developers has also raised concerns about the environment. In order to reduce the problems related to aqueous development, solvents or materials with desirable properties must be used. Recently, there has also been growing interest in solvent-based negative-tone development (NTD) due to its better performance in printing certain feature types. Therefore, solvent-based development of photoresists was investigated in this study. One approach to reduce the pattern collapse problem and environmental issues of the lithographic process is through the use of environmentally friendly solvents with low surface tension. Supercritical carbon dioxide (scCO2) and linear methyl siloxanes (LMS) are green solvents that have low toxicity, low surface tension, low viscosity and can be recycled. Solvent-based development of both polymeric and molecular glass resists with positive- and negative-tone images have been successfully demonstrated in both solvents. High-resolution and high aspect ratio patterns were obtained with no pattern collapse observed using both solvents. As there is little iii understanding about the solvent power of linear methyl siloxanes, the dissolution behavior of polymers and molecular glasses in linear methyl siloxanes was also studied. Besides using low surface tension developers to mitigate pattern collapse problem, another approach is by using materials with high etch resistance that eliminates the use of thick films. Also, because of the low intensity of current EUV light source, the next-generation resists need to demonstrate high sensitivity and optimum absorbance. Inorganic metal oxide nanoparticles based on zirconium oxide (ZrO2) and hafnium oxide (HfO2) with organic ligands have been synthesized for EUV lithography. These nanoparticle resists can be developed as negative-tone patterns using an organic solvent and high-resolution patterns were achieved. The patterning performance of these nanoparticles in different organic solvents was also evaluated. iv.

Photomask and Next generation Lithography Mask Technology

Photomask and Next generation Lithography Mask Technology Book
Author : Anonim
Publisher : Unknown
Release : 2001
ISBN : 0987650XXX
Language : En, Es, Fr & De

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Book Description :

Download Photomask and Next generation Lithography Mask Technology book written by , available in PDF, EPUB, and Kindle, or read full book online anywhere and anytime. Compatible with any devices.

Nano and Giga Challenges in Microelectronics

Nano and Giga Challenges in Microelectronics Book
Author : J. Greer,A. Korkin,J. Labanowski
Publisher : Elsevier
Release : 2003-10-24
ISBN : 0080537219
Language : En, Es, Fr & De

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Book Description :

The book is designed as an introduction for engineers and researchers wishing to obtain a fundamental knowledge and a snapshot in time of the cutting edge in technology research. As a natural consequence, Nano and Giga Challenges is also an essential reference for the "gurus" wishing to keep abreast of the latest directions and challenges in microelectronic technology development and future trends. The combination of viewpoints presented within the book can help to foster further research and cross-disciplinary interaction needed to surmount the barriers facing future generations of technology design. Key Features: • Quickly becoming the hottest topic of the new millennium (2.4 billion dollars funding in US alone • Current status and future trends of micro and nanoelectronics research • Written by leading experts in the corresponding research areas • Excellent tutorial for graduate students and reference for "gurus"

Small Molecule Photoresist Materials for Next Generation Lithography

Small Molecule Photoresist Materials for Next Generation Lithography Book
Author : Marie Elyse Krysak
Publisher : Unknown
Release : 2013
ISBN : 0987650XXX
Language : En, Es, Fr & De

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Book Description :

Photolithography remains the most efficient method to create semiconductor devices. Moore's law states that the number of transistors per integrated circuit will double every four years. In order to successfully continue this trend of miniaturizing feature sizes, new, smaller sized patterning materials must be studied. Small molecule photoresists are being developed for high resolution patterning. Low molecular weight amorphous materials, or molecular glasses (MGs), have emerged as alternatives to polymeric resist materials. They combine the benefits of small molecular size with the favorable aspects of polymers, such as a high glass transition temperature (Tg) and the ability to form thin films. Inorganic-based nanoparticles are currently being explored as next generation photoresists. These materials are similar in architecture to MGs, but are comprised of an inorganic core that provides excellent thermal stability and resistance to plasma etching. This research focuses on the synthesis and characterization both MG and nanoparticle resist materials for high resolution patterning. The materials studied are designed for use with Extreme Ultraviolet Lithography (EUV-L), using a wavelength of 13.5 nm. This next-generation technique is believed to be the key to extending patterning capabilities to sub 30 nm and beyond. Small molecule resists materials have been specifically designed for use with alternative lithographic processing techniques. Small, rigid structures were designed for vapor deposition, which has been examined as an alternative to spin-coating. This process has been shown to deposit a uniform film, free from defects and impurities, without the use of solvent. Sub-millisecond laser heating is a relatively new technique that is studied as an alternative the post exposure bake. This method has shown the ability to reduce line edge roughness while simultaneously improving resist sensitivity. Systematically designed MG photoacid generators have been used to characterize the acid diffusion behavior during laser heating as compared to traditional hotplate heating. The development of resist materials for these new processes is a critical step in the preparation of these processes for widespread use in lithographic processing. ii.

Direct Write Technologies for Rapid Prototyping Applications

Direct Write Technologies for Rapid Prototyping Applications Book
Author : Alberto Pique,Douglas B. Chrisey
Publisher : Academic Press
Release : 2002
ISBN : 9780121742317
Language : En, Es, Fr & De

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Book Description :

Direct-Write Technologies covers applications, materials, and the techniques in using direct-write technologies. This book provides an overview of the different direct write techniques currently available, as well as a comparison between the strengths and special attributes for each of the techniques. The techniques described open the door for building prototypes and testing materials. The book also provides an overview of the state-of-the-art technology involved in this field. Basic academic researchers and industrial development engineers who pattern thin film materials will want to have this text on their shelves as a resource for specific applications. Others in this or related fields will want the book to read the introductory material summarizing isuses common to all approaches, in order to compare and contrast different techniques. Everyday applications include electronic components and sensors, especially chemical and biosensors. There is a wide range of research and development problems requiring state-of-the-art direct write tools. This book will appeal to basic researchers and development engineers in university engineering departments and at industrial and national research laboratories. This text should appeal equally well in the United States, Asia, and Europe. Both basic academic researchers and industrial development engineers who pattern thin film materials will want to have this text on their shelves as a resource for specific applications. An overview of the different direct write techniques currently available A comparison between the strengths and special attributes for each of the techniques An overview of the state-of-the-art technology involved in this field

Sub Half Micron Lithography for ULSIs

Sub Half Micron Lithography for ULSIs Book
Author : Katsumi Suzuki,Shinji Matsui,Yukinori Ochiai
Publisher : Cambridge University Press
Release : 2000-06
ISBN : 9780521570800
Language : En, Es, Fr & De

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Book Description :

Original figures and tables are presented to highlight the key issues and recent developments." "This book will be of value to graduate students studying semiconductor-device fabrication, to engineers engaged in such fabrication and to designers of ULSI devices."--Jacket.

Handbook of Semiconductor Manufacturing Technology

Handbook of Semiconductor Manufacturing Technology Book
Author : Yoshio Nishi,Robert Doering
Publisher : CRC Press
Release : 2017-12-19
ISBN : 1420017667
Language : En, Es, Fr & De

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Book Description :

Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.