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Handbook Of Thin Film Deposition

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Handbook of Thin Film Technology

Handbook of Thin Film Technology Book
Author : Hartmut Frey,Hamid R. Khan
Publisher : Springer Science & Business Media
Release : 2015-05-06
ISBN : 3642054307
Language : En, Es, Fr & De

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Book Description :

“Handbook of Thin Film Technology” covers all aspects of coatings preparation, characterization and applications. Different deposition techniques based on vacuum and plasma processes are presented. Methods of surface and thin film analysis including coating thickness, structural, optical, electrical, mechanical and magnetic properties of films are detailed described. The several applications of thin coatings and a special chapter focusing on nanoparticle-based films can be found in this handbook. A complete reference for students and professionals interested in the science and technology of thin films.

Handbook of Deposition Technologies for Films and Coatings

Handbook of Deposition Technologies for Films and Coatings Book
Author : Peter M. Martin
Publisher : William Andrew
Release : 2009-12-01
ISBN : 0815520328
Language : En, Es, Fr & De

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Book Description :

This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications. * Explains in depth the many recent i

Handbook of Sputter Deposition Technology

Handbook of Sputter Deposition Technology Book
Author : Kiyotaka Wasa,Isaku Kanno,Hidetoshi Kotera
Publisher : William Andrew
Release : 2012-11-20
ISBN : 1437734839
Language : En, Es, Fr & De

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Book Description :

Sputtering is a Physical Vapor Deposition vacuum process used to deposit very thin films onto a substrate for a wide variety of commercial and scientific purposes. Sputtering occurs when an ionized gas molecule is used to displace atoms of a specific material. These atoms then bond at the atomic level to a substrate and create a thin film. Several types of sputtering processes exist, including: ion beam, diode, and magnetron sputtering. Cathode sputtering is widely used in the microelectronics industry for silicon integrated circuit production and for metallic coatings. High temperature, diamond films and ferroelectric materials are other applications. Sputtering applications are important across a wide range of industries, including the automotive, medical, semiconductors, space, plastics, and military sectors. A strong applications focus, covering current and emerging technologies, including nano-materials and MEMS (microelectrolmechanical systems) for energy, environments, communications, and/or bio-medical field. New chapters on computer simulation of sputtering and MEMS completes the update and insures that the new edition includes the most current and forward-looking coverage available. All applications discussed are supported by theoretical discussions, offering readers both the "how" and the "why" of each technique. 40% revision: the new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications that are covered in the book and providing the most up-to-date coverage available anywhere.

Handbook of Thin Film Process Technology

Handbook of Thin Film Process Technology Book
Author : D Glocker
Publisher : CRC Press
Release : 2018-01-18
ISBN : 1351081241
Language : En, Es, Fr & De

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Book Description :

The Handbook of Thin Film Process Technology is a practical handbook for the thin film scientist, engineer and technician. This handbook is regularly updated with new material, and this volume presents additional recipe-type information (i.e. important deposition system details and process parameters) for optical materials.

The Materials Science of Thin Films

The Materials Science of Thin Films Book
Author : Milton Ohring
Publisher : Academic Press
Release : 1992
ISBN : 9780125249904
Language : En, Es, Fr & De

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Book Description :

Prepared as a textbook complete with problems after each chapter, specifically intended for classroom use in universities.

Handbook of Thin Film Deposition

Handbook of Thin Film Deposition Book
Author : Krishna Seshan,Dominic Schepis
Publisher : William Andrew
Release : 2018-02-23
ISBN : 0128123125
Language : En, Es, Fr & De

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Book Description :

Handbook of Thin Film Deposition, Fourth Edition, is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry and the closely related areas of thin film deposition, thin film micro properties, photovoltaic solar energy applications, materials for memory applications and methods for thin film optical processes. The book is broken up into three sections: scaling, equipment and processing, and applications. In this newly revised edition, the handbook will also explore the limits of thin film applications, most notably as they relate to applications in manufacturing, materials, design and reliability. Offers a practical survey of thin film technologies aimed at engineers and managers involved in all stages of the process: design, fabrication, quality assurance, applications and the limitations faced by those processes Covers core processes and applications in the semiconductor industry and new developments within the photovoltaic and optical thin film industries Features a new chapter discussing Gates Dielectrics

Handbook of Thin Film Deposition Processes and Techniques

Handbook of Thin Film Deposition Processes and Techniques Book
Author : Krishna Seshan
Publisher : William Andrew
Release : 2001-02-01
ISBN : 0815517785
Language : En, Es, Fr & De

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Book Description :

New second edition of the popular book on deposition (first edition by Klaus Schruegraf) for engineers, technicians, and plant personnel in the semiconductor and related industries. This book traces the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition techniques and the development of highly specialized equipment to enable this deposition. The book includes much cutting-edge material. Entirely new chapters on contamination and contamination control describe the basics and the issues—as feature sizes shrink to sub-micron dimensions, cleanliness and particle elimination has to keep pace. A new chapter on metrology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together all the physical vapor deposition techniques. Two entirely new areas receive full treatment: chemical mechanical polishing which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.

Handbook of Physical Vapor Deposition PVD Processing

Handbook of Physical Vapor Deposition  PVD  Processing Book
Author : D. M. Mattox
Publisher : Cambridge University Press
Release : 2014-09-19
ISBN : 0080946585
Language : En, Es, Fr & De

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Book Description :

This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.

Handbook of Crystal Growth

Handbook of Crystal Growth Book
Author : Peter Rudolph
Publisher : Elsevier
Release : 2014-11-04
ISBN : 0444633065
Language : En, Es, Fr & De

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Book Description :

Vol 2A: Basic Technologies Handbook of Crystal Growth, 2nd Edition Volume IIA (Basic Technologies) presents basic growth technologies and modern crystal cutting methods. Particularly, the methodical fundamentals and development of technology in the field of bulk crystallization on both industrial and research scales are explored. After an introductory chapter on the formation of minerals, ruling historically the basic crystal formation parameters, advanced basic technologies from melt, solution, and vapour being applied for research and production of the today most important materials, like silicon, semiconductor compounds and oxides are presented in detail. The interdisciplinary and general importance of crystal growth for human live are illustrated. Vol 2B: Growth Mechanisms and Dynamics Handbook of Crystal Growth, 2nd Edition Volume IIB (Growth Mechanisms and Dynamics) deals with characteristic mechanisms and dynamics accompanying each bulk crystal growth method discussed in Volume IIA. Before the atoms or molecules pass over from a position in the fluid medium (gas, melt or solution) to their place in the crystalline face they must be transported in the fluid over macroscopic distances by diffusion, buoyancy-driven convection, surface-tension-driven convection, and forced convection (rotation, acceleration, vibration, magnetic mixing). Further, the heat of fusion and the part carried by the species on their way to the crystal by conductive and convective transport must be dissipated in the solid phase by well-organized thermal conduction and radiation to maintain a stable propagating interface. Additionally, segregation and capillary phenomena play a decisional role for chemical composition and crystal shaping, respectively. Today, the increase of high-quality crystal yield, its size enlargement and reproducibility are imperative conditions to match the strong economy. Volume 2A Presents the status and future of Czochralski and float zone growth of dislocation-free silicon Examines directional solidification of silicon ingots for photovoltaics, vertical gradient freeze of GaAs, CdTe for HF electronics and IR imaging as well as antiferromagnetic compounds and super alloys for turbine blades Focuses on growth of dielectric and conducting oxide crystals for lasers and non-linear optics Topics on hydrothermal, flux and vapour phase growth of III-nitrides, silicon carbide and diamond are explored Volume 2B Explores capillarity control of the crystal shape at the growth from the melt Highlights modeling of heat and mass transport dynamics Discusses control of convective melt processes by magnetic fields and vibration measures Includes imperative information on the segregation phenomenon and validation of compositional homogeneity Examines crystal defect generation mechanisms and their controllability Illustrates proper automation modes for ensuring constant crystal growth process Exhibits fundamentals of solution growth, gel growth of protein crystals, growth of superconductor materials and mass crystallization for food and pharmaceutical industries

Thin Film Deposition Principles and Practice

Thin Film Deposition  Principles and Practice Book
Author : Donald L. Smith
Publisher : McGraw Hill Professional
Release : 1995-03-22
ISBN : 9780070585027
Language : En, Es, Fr & De

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Book Description :

Publisher's Note: Products purchased from Third Party sellers are not guaranteed by the publisher for quality, authenticity, or access to any online entitlements included with the product.

Handbook of Thin Film Process Technology

Handbook of Thin Film Process Technology Book
Author : David A Glocker
Publisher : CRC Press
Release : 2018-01-18
ISBN : 1351089684
Language : En, Es, Fr & De

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Book Description :

The Handbook of Thin Film Process Technology is a practical handbook for the thin film scientist, engineer and technician. This handbook is regularly updated with new material, and this volume is a special issue on reactive sputtering which will be of interest to a wide range of industrial and academic researchers in addition to owners of the main Handbook. Some recent developments in the reactive sputtering field are covered, including unbalanced magnetron sputtering and pulsed reactive sputtering. The articles contain a wealth of practical information relating to applications, practice and manufacturing techniques.

Optical Thin Films

Optical Thin Films Book
Author : James D. Rancourt
Publisher : SPIE Press
Release : 1996
ISBN : 9780819422859
Language : En, Es, Fr & De

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Book Description :

Practical, user-oriented reference for engineers who must incorporate and specify coatings for filters, antiglare effects, polarization, or other purposes in optical or electro-optical systems design. It focuses on preparation techniques and characteristics of commercially available products and provides information needed to determine what type of filter is needed to solve a particular problem, what its limitations are, and how to care for it.

Chemical Physics of Thin Film Deposition Processes for Micro and Nano Technologies

Chemical Physics of Thin Film Deposition Processes for Micro  and Nano Technologies Book
Author : Y. Pauleau
Publisher : Springer Science & Business Media
Release : 2012-12-06
ISBN : 940100353X
Language : En, Es, Fr & De

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Book Description :

An up-to-date collection of tutorial papers on the latest advances in the deposition and growth of thin films for micro and nano technologies. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films. Gas-phase phenomena, surface chemistry, growth mechanisms and the modelling of deposition processes are thoroughly described and discussed to provide a clear understanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes. A handbook for engineers and scientists and an introduction for students of microelectronics.

Thin Film Technology Handbook

Thin Film Technology Handbook Book
Author : Aicha Elshabini,Aicha Elshabini-Riad,Fred D. Barlow,Fred D Barlow
Publisher : McGraw Hill Professional
Release : 1998
ISBN : 9780070190252
Language : En, Es, Fr & De

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Book Description :

The most comprehensive source available on the preparation, characterization, and emerging applications of thin film. This book features extensive new advances applied in multichip modules (MCMs), and covers the basic principles and applications of thin film deposition techniques for practical use. It provides and develops design guidelines to realize multilayer structures in microcircuits, thus addressing a critical and rapidly growing area.

Handbook of Chemical Vapor Deposition

Handbook of Chemical Vapor Deposition Book
Author : Hugh O. Pierson
Publisher : William Andrew
Release : 2012-12-02
ISBN : 1437744885
Language : En, Es, Fr & De

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Book Description :

Handbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor deposition. This book discusses the applications of chemical vapor deposition, which is a relatively flexible technology that can accommodate many variations. Organized into 12 chapters, this book begins with an overview of the theoretical examination of the chemical vapor deposition process. This text then describes the major chemical reactions and reviews the chemical vapor deposition systems and equipment used in research and production. Other chapters consider the materials deposited by chemical vapor deposition. This book discusses as well the potential applications of chemical vapor deposition in semiconductors and electronics. The final chapter deals with ion implantation as a major process in the fabrication of semiconductors. This book is a valuable resource for scientists, engineers, and students. Production and marketing managers and suppliers of equipment, materials, and services will also find this book useful.

Glancing Angle Deposition of Thin Films

Glancing Angle Deposition of Thin Films Book
Author : Matthew M. Hawkeye,Michael T. Taschuk,Michael J. Brett
Publisher : John Wiley & Sons
Release : 2014-07-03
ISBN : 1118847334
Language : En, Es, Fr & De

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Book Description :

This book provides a highlypractical treatment of Glancing Angle Deposition (GLAD), a thinfilm fabrication technology optimized to produce precisenanostructures from a wide range of materials. GLAD providesan elegant method for fabricating arrays of nanoscale helices,chevrons, columns, and other porous thin film architectures usingphysical vapour deposition processes such as sputtering orevaporation. The book gathers existing procedures,methodologies, and experimental designs into a single, cohesivevolume which will be useful both as a ready reference for those inthe field and as a definitive guide for those entering it. Itcovers: Development and description of GLAD techniques fornanostructuring thin films Properties and characterization of nanohelices, nanoposts, andother porous films Design and engineering of optical GLAD films includingfabrication and testing, and chiral films Post-deposition processing and integration to optimize filmbehaviour and structure Deposition systems and requirements for GLAD fabrication A patent survey, extensiverelevant literature, and a survey of GLAD’s wide range ofmaterial properties and diverse applications.

Handbook of Thin Films Five Volume Set

Handbook of Thin Films  Five Volume Set Book
Author : Hari Singh Nalwa
Publisher : Academic Press
Release : 2001-10-29
ISBN : 0125129084
Language : En, Es, Fr & De

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Book Description :

This five-volume handbook focuses on processing techniques, characterization methods, and physical properties of thin films (thin layers of insulating, conducting, or semiconductor material). The editor has composed five separate, thematic volumes on thin films of metals, semimetals, glasses, ceramics, alloys, organics, diamonds, graphites, porous materials, noncrystalline solids, supramolecules, polymers, copolymers, biopolymers, composites, blends, activated carbons, intermetallics, chalcogenides, dyes, pigments, nanostructured materials, biomaterials, inorganic/polymer composites, organoceramics, metallocenes, disordered systems, liquid crystals, quasicrystals, and layered structures. Thin films is a field of the utmost importance in today's materials science, electrical engineering and applied solid state physics; with both research and industrial applications in microelectronics, computer manufacturing, and physical devices. Advanced, high-performance computers, high-definition TV, digital camcorders, sensitive broadband imaging systems, flat-panel displays, robotic systems, and medical electronics and diagnostics are but a few examples of miniaturized device technologies that depend the utilization of thin film materials. The Handbook of Thin Films Materials is a comprehensive reference focusing on processing techniques, characterization methods, and physical properties of these thin film materials.

Thin Film Processes

Thin Film Processes Book
Author : John L. Vossen
Publisher : Elsevier
Release : 2012-12-02
ISBN : 0323138985
Language : En, Es, Fr & De

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Book Description :

Remarkable advances have been made in recent years in the science and technology of thin film processes for deposition and etching. It is the purpose of this book to bring together tutorial reviews of selected filmdeposition and etching processes from a process viewpoint. Emphasis is placed on the practical use of the processes to provide working guidelines for their implementation, a guide to the literature, and an overview of each process.

Optical Thin Films and Coatings

Optical Thin Films and Coatings Book
Author : Angela Piegari,François Flory
Publisher : Elsevier
Release : 2013-08-31
ISBN : 0857097318
Language : En, Es, Fr & De

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Book Description :

Optical coatings, including mirrors, anti-reflection coatings, beam splitters, and filters, are an integral part of most modern optical systems. Optical thin films and coatings provides an overview of thin film materials, the properties, design and manufacture of optical coatings and their use across a variety of application areas. Part one explores the design and manufacture of optical coatings. Part two highlights unconventional features of optical thin films including scattering properties of random structures in thin films, optical properties of thin film materials at short wavelengths, thermal properties and colour effects. Part three focusses on novel materials for optical thin films and coatings and includes chapters on organic optical coatings, surface multiplasmonics and optical thin films containing quantum dots. Finally, applications of optical coatings, including laser components, solar cells, displays and lighting, and architectural and automotive glass, are reviewed in part four. Optical thin films and coatings is a technical resource for researchers and engineers working with optical thin films and coatings, professionals in the security, automotive, space and other industries requiring an understanding of these topics, and academics interested in the field. An overview of the materials, properties, design and manufacture of thin films Special attention is given to the unconventional features and novel materials of optical thin films Reviews applications of optical coatings including laser components, solar cells, glasing, displays and lighting

Diamond Films Handbook

Diamond Films Handbook Book
Author : Jes Asmussen,D Reinhard
Publisher : CRC Press
Release : 2002-01-23
ISBN : 9780203910603
Language : En, Es, Fr & De

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Book Description :

The Diamond Films Handbook is an important source of information for readers involved in the new diamond film technology, emphasizing synthesis technologies and diamond film applications. Containing over 1600 references, drawings, photographs, micrographs, equations, and tables, and contributions by experts from both industry and academia, it inclu