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Handbook Of Sputter Deposition Technology

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Handbook of Sputter Deposition Technology

Handbook of Sputter Deposition Technology Book
Author : Kiyotaka Wasa,Isaku Kanno,Hidetoshi Kotera
Publisher : William Andrew
Release : 2012
ISBN : 1437734839
Language : En, Es, Fr & De

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Book Description :

Sputtering is a Physical Vapor Deposition vacuum process used to deposit very thin films onto a substrate for a wide variety of commercial and scientific purposes. Sputtering occurs when an ionized gas molecule is used to displace atoms of a specific material. These atoms then bond at the atomic level to a substrate and create a thin film. Several types of sputtering processes exist, including: ion beam, diode, and magnetron sputtering. Cathode sputtering is widely used in the microelectronics industry for silicon integrated circuit production and for metallic coatings. High temperature, diamond films and ferroelectric materials are other applications. Sputtering applications are important across a wide range of industries, including the automotive, medical, semiconductors, space, plastics, and military sectors. A strong applications focus, covering current and emerging technologies, including nano-materials and MEMS (microelectrolmechanical systems) for energy, environments, communications, and/or bio-medical field. New chapters on computer simulation of sputtering and MEMS completes the update and insures that the new edition includes the most current and forward-looking coverage available. All applications discussed are supported by theoretical discussions, offering readers both the "how" and the "why" of each technique. 40% revision: the new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications that are covered in the book and providing the most up-to-date coverage available anywhere.

Handbook of Sputter Deposition Technology

Handbook of Sputter Deposition Technology Book
Author : Shigeru Hayakawa
Publisher : William Andrew Publishing
Release : 1992-01-01
ISBN : 9780815512806
Language : En, Es, Fr & De

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Book Description :

A concise, comprehensive overview of sputter deposition technologyùa key technology for materials research in the next decade. Cathode sputtering is widely used in the microelectronics industry for silicon integrated circuit production and for metallurgical coatings. High temperature superconductors can be synthesized with sputtering under non-equilibrium conditions. Diamond films and ferroelectric materials are other applications.

Handbook of Deposition Technologies for Films and Coatings

Handbook of Deposition Technologies for Films and Coatings Book
Author : Peter M. Martin
Publisher : William Andrew
Release : 2009-12-01
ISBN : 0815520328
Language : En, Es, Fr & De

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Book Description :

This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications. * Explains in depth the many recent i

Handbook of Deposition Technologies for Films and Coatings

Handbook of Deposition Technologies for Films and Coatings Book
Author : Rointan Framroze Bunshah
Publisher : William Andrew
Release : 1994
ISBN : 0815513372
Language : En, Es, Fr & De

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Book Description :

This second edition, edited by the world-renowned Dr. Rointain Bunshah, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. Considerably more material was added in Plasma Assisted Vapor Deposition processes, as well as Metallurgical Coating Applications.

Handbook of Thin Film Deposition Processes and Techniques

Handbook of Thin Film Deposition Processes and Techniques Book
Author : Krishna Seshan
Publisher : William Andrew
Release : 2001-02-01
ISBN : 0815517785
Language : En, Es, Fr & De

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Book Description :

New second edition of the popular book on deposition (first edition by Klaus Schruegraf) for engineers, technicians, and plant personnel in the semiconductor and related industries. This book traces the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition techniques and the development of highly specialized equipment to enable this deposition. The book includes much cutting-edge material. Entirely new chapters on contamination and contamination control describe the basics and the issues—as feature sizes shrink to sub-micron dimensions, cleanliness and particle elimination has to keep pace. A new chapter on metrology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together all the physical vapor deposition techniques. Two entirely new areas receive full treatment: chemical mechanical polishing which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.

Handbook of Physical Vapor Deposition PVD Processing

Handbook of Physical Vapor Deposition  PVD  Processing Book
Author : D. M. Mattox
Publisher : Cambridge University Press
Release : 2014-09-19
ISBN : 9780080946580
Language : En, Es, Fr & De

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Book Description :

This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.

Handbook of Hard Coatings

Handbook of Hard Coatings Book
Author : Rointan F. Bunshah,Christian Weissmantel
Publisher : Cambridge University Press
Release : 2001
ISBN : 9780815514381
Language : En, Es, Fr & De

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Book Description :

Written by 12 leading experts, this is an essential resource for fabrication, characterization and applications in the field of hard coatings and wear resistant surfaces. Offering complete explanations of commercially oriented deposition technology, from traditional vacuum. Includes a detailed introduction to the science of characterizing and measuring hard coatings.

Handbook of Ion Beam Processing Technology

Handbook of Ion Beam Processing Technology Book
Author : Jerome J. Cuomo,Stephen M. Rossnagel,Harold R. Kaufman,Stephen M. Haber
Publisher : William Andrew
Release : 1989
ISBN : 0987650XXX
Language : En, Es, Fr & De

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Book Description :

Deals with ion beam processing for basic sputter etching of samples, sputter deposition of thin films, the synthesis of material in thin film form, and the modification of the properties of thin films.

Handbook of Optical Properties

Handbook of Optical Properties Book
Author : Rolf E. Hummel,Karl H. Guenther
Publisher : CRC Press
Release : 1995-02-24
ISBN : 9780849324840
Language : En, Es, Fr & De

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Book Description :

Thin Films for Optical Coating emphasizes the applications of thin films, deposition of thin films, and thin film characterization. Unlike monographs on this subject, this book presents the views of many expert authors. Individual chapters span a wide arc of topics within this field of study. The book offers an introduction to usual and unusual applications of optical thin films, treating in a more qualitative way general topics such as anticounterfeiting coatings, decorative coatings, light switches, contrast enhancement coatings, multiplexers, optical memories, and more. Contributors review thin film media for optical data storage, UV broadband and narrow-band filters, and optically active thin film coatings. Ion beam sputtering and magnetron sputtering deposition methods are described in detail. Characterization techniques are provided, including Raman spectroscopy and absorption measurements. The book also offers theories on light scattering of thin dielectric films and the electromagnetic properties of nanocermet thin films. This reference incorporates recent research by the individual authors with their views of current developments in their respective fields. Of particular interest to the reader will be an assessment of the historical developments of thin film physics written by one of the fathers of thin film technology, Professor M. Auwärter.

Handbook of Thin Film Technology

Handbook of Thin Film Technology Book
Author : Hartmut Frey,Hamid R. Khan
Publisher : Springer Science & Business Media
Release : 2015-05-06
ISBN : 3642054307
Language : En, Es, Fr & De

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Book Description :

“Handbook of Thin Film Technology” covers all aspects of coatings preparation, characterization and applications. Different deposition techniques based on vacuum and plasma processes are presented. Methods of surface and thin film analysis including coating thickness, structural, optical, electrical, mechanical and magnetic properties of films are detailed described. The several applications of thin coatings and a special chapter focusing on nanoparticle-based films can be found in this handbook. A complete reference for students and professionals interested in the science and technology of thin films.

Handbook of Industrial Refractories Technology

Handbook of Industrial Refractories Technology Book
Author : Stephen Caniglia,Gordon L. Barna
Publisher : William Andrew
Release : 1992-12-31
ISBN : 0815517564
Language : En, Es, Fr & De

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Book Description :

Encompasses the entire range of industrial refractory materials and forms: properties and their measurement, applications, manufacturing, installation and maintenance techniques, quality assurance, and statistical process control.

Handbook of Thin Film Deposition Techniques Principles Methods Equipment and Applications Second Editon

Handbook of Thin Film Deposition Techniques Principles  Methods  Equipment and Applications  Second Editon Book
Author : Krishna Seshan
Publisher : CRC Press
Release : 2002-02-01
ISBN : 1482269686
Language : En, Es, Fr & De

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Book Description :

The Handbook of Thin Film Deposition Techniques: Principles, Methods, Equipment and Applications, Second Edition explores the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition tec

Handbook of Vacuum Science and Technology

Handbook of Vacuum Science and Technology Book
Author : Dorothy Hoffman,Bawa Singh,John H. Thomas, III
Publisher : Elsevier
Release : 1997-10-29
ISBN : 9780080533759
Language : En, Es, Fr & De

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Book Description :

The Handbook of Vacuum Technology consists of the latest innovations in vacuum science and technology with a strong orientation towards the vacuum practitioner. It covers many of the new vacuum pumps, materials, equipment, and applications. It also details the design and maintenance of modern vacuum systems. The authors are well known experts in their individual fields with the emphasis on performance, limitations, and applications rather than theory. There aremany useful tables, charts, and figures that will be of use to the practitioner. User oriented with many useful tables, charts, and figures of use to the practitioner Reviews new vacuum materials and equipment Illustrates the design and maintenance of modern vacuum systems Includes well referenced chapters

Handbook of Thin film Deposition Processes and Techniques

Handbook of Thin film Deposition Processes and Techniques Book
Author : Klaus K. Schuegraf
Publisher : William Andrew
Release : 1988
ISBN : 0987650XXX
Language : En, Es, Fr & De

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Book Description :

The most recent developments and techniques in thin film deposition for high technology applications are described by 23 authorities in the field.

Slow Heavy Particle Induced Electron Emission from Solid Surfaces

Slow Heavy Particle Induced Electron Emission from Solid Surfaces Book
Author : Hannspeter Winter,Joachim Burgdörfer
Publisher : Springer Science & Business Media
Release : 2007-05-03
ISBN : 3540707883
Language : En, Es, Fr & De

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Book Description :

The emission of electrons from solid surfaces bombarded by slow neutral and ionized heavy particles (atoms, molecules) is reviewed both theoretically and in the light of recent experimental studies by leading groups in the field. The book integrates physics of ion beams, surfaces and chemical physics, and serves both as a reference work for researchers and a textbook for graduate students.

Coatings Technology Handbook Second Edition

Coatings Technology Handbook  Second Edition Book
Author : D. Satas,Arthur A. Tracton
Publisher : CRC Press
Release : 2000-11-01
ISBN : 9780824704391
Language : En, Es, Fr & De

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Book Description :

Serving as an all-in-one guide to the entire field of coatings technology, this encyclopedic reference covers a diverse range of topics-including basic concepts, coating types, materials, processes, testing, and applications- and summarizes the latest developments and standard coating methods. Helping readers apply the best coatings for their product needs, the book provides the insights and experience of over 100 recognized experts in over 100 chapters to select. Emphasizing an interdisciplinary exchange of ideas and approaches, the book is illustrated with more than 350 drawings and photographs, plus early 1400 literature references, equations, and tables.

Handbook of Semiconductor Wafer Cleaning Technology

Handbook of Semiconductor Wafer Cleaning Technology Book
Author : Werner Kern
Publisher : William Andrew
Release : 1993
ISBN : 0987650XXX
Language : En, Es, Fr & De

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Book Description :

"The cleaning of semiconductor wafers has become one of the most critical operations in the fabrication of semiconductor devices. The considerable body of technical and scientific literature is widely dispersed in numerous journals and symposia proceedings. This book brings together in one volume all pertinent knowledge on semiconductor wafer cleaning and its associated scientific and technical disciplines. It provides the first comprehensive and up-to-date coverage of this rapidly evolving field. Its thirteen chapters were written by nineteen scientists who are recognized experts in each topic." "The scope of this book is very broad, covering all aspects of wafer cleaning. Emphasis is on practical applications in the fab combined with authoritative scientific background information to provide a solid scientific basis for understanding the chemical and physical processes involved in cleaning and in the analytical methods of testing and evaluation." "The depth and breadth of the material should appeal to those new in the field as well as to experienced professionals. The volume is intended to serve as a handbook for practitioners and professionals in the field of semiconductor microelectronics, including fab engineers, scientists and technicians. It should also prove useful to manufacturers of processing equipment, persons concerned with contamination control and analysis, and students attending advanced or specialized technical courses."--BOOK JACKET.Title Summary field provided by Blackwell North America, Inc. All Rights Reserved

Semiconductor Industrial Hygiene Handbook

Semiconductor Industrial Hygiene Handbook Book
Author : Michael E. Williams,David G. Baldwin,Paul C. Manz
Publisher : William Andrew
Release : 1995
ISBN : 0987650XXX
Language : En, Es, Fr & De

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Book Description :

This book provides a comprehensive review of the primary industrial hygiene topics relevant to semiconductor processing: chemical and physical agents, and ventilation systems. The book also has excellent chapters on newer industrial hygiene concerns that are not specific to the semiconductor industry: ergonomics, indoor air quality, personal protective equipment, plan review, and records retention. While much of the information in these chapters can be applied to all industries, the focus and orientation is specific to issues in the semiconductor industry.

Handbook of Carbon Graphite Diamonds and Fullerenes

Handbook of Carbon  Graphite  Diamonds and Fullerenes Book
Author : Hugh O. Pierson
Publisher : William Andrew
Release : 1993
ISBN : 0987650XXX
Language : En, Es, Fr & De

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Book Description :

This book is a review of the science and technology of the element carbon and its allotropes: graphite, diamond and the fullerenes. This field has expanded greatly in the last three decades stimulated by many major discoveries such as carbon fibers, low-pressure diamond and the fullerenes. These carbon materials are very different in structure and properties. Some are very old (charcoal), others new (the fullerenes). They have different applications and markets and are produced by different segments of the industry.

Handbook of VLSI Microlithography

Handbook of VLSI Microlithography Book
Author : William B. Glendinning,John N. Helbert
Publisher : William Andrew
Release : 1991-01-15
ISBN : 0987650XXX
Language : En, Es, Fr & De

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Book Description :

This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings-- including optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely covered -- including an entire chapter on resist process defectivity and the potential yield limiting effect on device production. Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.