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Handbook Of Silicon Wafer Cleaning Technology

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Handbook of Silicon Wafer Cleaning Technology

Handbook of Silicon Wafer Cleaning Technology Book
Author : Karen Reinhardt,Werner Kern
Publisher : William Andrew
Release : 2018-03-16
ISBN : 032351085X
Language : En, Es, Fr & De

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Book Description :

Handbook of Silicon Wafer Cleaning Technology, Third Edition, provides an in-depth discussion of cleaning, etching and surface conditioning for semiconductor applications. The fundamental physics and chemistry associated with wet and plasma processing are reviewed, including surface and colloidal aspects. This revised edition includes the developments of the last ten years to accommodate a continually involving industry, addressing new technologies and materials, such as germanium and III-V compound semiconductors, and reviewing the various techniques and methods for cleaning and surface conditioning. Chapters include numerous examples of cleaning technique and their results. The book helps the reader understand the process they are using for their cleaning application and why the selected process works. For example, discussion of the mechanism and physics of contamination, metal, particle and organic includes information on particle removal, metal passivation, hydrogen-terminated silicon and other processes that engineers experience in their working environment. In addition, the handbook assists the reader in understanding analytical methods for evaluating contamination. The book is arranged in an order that segments the various cleaning techniques, aqueous and dry processing. Sections include theory, chemistry and physics first, then go into detail for the various methods of cleaning, specifically particle removal and metal removal, amongst others. Focuses on cleaning techniques including wet, plasma and other surface conditioning techniques used to manufacture integrated circuits Reliable reference for anyone that manufactures integrated circuits or supplies the semiconductor and microelectronics industries Covers processes and equipment, as well as new materials and changes required for the surface conditioning process

Handbook of Silicon Wafer Cleaning Technology 2nd Edition

Handbook of Silicon Wafer Cleaning Technology  2nd Edition Book
Author : Karen Reinhardt,Werner Kern
Publisher : William Andrew
Release : 2008-12-10
ISBN : 0815517734
Language : En, Es, Fr & De

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Book Description :

The second Edition of the Handbook of Silicon Wafer Cleaning Technology is intended to provide knowledge of wet, plasma, and other surface conditioning techniques used to manufacture integrated circuits. The integration of the clean processes into the device manufacturing flow will be presented with respect to other manufacturing steps such as thermal, implant, etching, and photolithography processes. The Handbook discusses both wet and plasma-based cleaning technologies that are used for removing contamination, particles, residue, and photoresist from wafer surfaces. Both the process and the equipment are covered. A review of the current cleaning technologies is included. Also, advanced cleaning technologies that are under investigation for next generation processing are covered; including supercritical fluid, laser, and cryoaerosol cleaning techniques. Additionally theoretical aspects of the cleaning technologies and how these processes affect the wafer is discussed such as device damage and surface roughening will be discussed. The analysis of the wafers surface is outlined. A discussion of the new materials and the changes required for the surface conditioning process used for manufacturing is also included. Focused on silicon wafer cleaning techniques including wet, plasma, and other surface conditioning techniques used to manufacture integrated circuits As this book covers the major technologies for removing contaminants, it is a reliable reference for anyone that manufactures integrated circuits, or supplies the semiconductor and microelectronics industries Covers processes and equipment, as well as new materials and changes required for the surface conditioning process Editors are two of the top names in the field and are both extensively published Discusses next generation processing techniques including supercritical fluid, laser, and cryoaerosol

Handbook of Semiconductor Wafer Cleaning Technology

Handbook of Semiconductor Wafer Cleaning Technology Book
Author : Werner Kern
Publisher : William Andrew
Release : 1993
ISBN : 0987650XXX
Language : En, Es, Fr & De

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Book Description :

"The cleaning of semiconductor wafers has become one of the most critical operations in the fabrication of semiconductor devices. The considerable body of technical and scientific literature is widely dispersed in numerous journals and symposia proceedings. This book brings together in one volume all pertinent knowledge on semiconductor wafer cleaning and its associated scientific and technical disciplines. It provides the first comprehensive and up-to-date coverage of this rapidly evolving field. Its thirteen chapters were written by nineteen scientists who are recognized experts in each topic." "The scope of this book is very broad, covering all aspects of wafer cleaning. Emphasis is on practical applications in the fab combined with authoritative scientific background information to provide a solid scientific basis for understanding the chemical and physical processes involved in cleaning and in the analytical methods of testing and evaluation." "The depth and breadth of the material should appeal to those new in the field as well as to experienced professionals. The volume is intended to serve as a handbook for practitioners and professionals in the field of semiconductor microelectronics, including fab engineers, scientists and technicians. It should also prove useful to manufacturers of processing equipment, persons concerned with contamination control and analysis, and students attending advanced or specialized technical courses."--BOOK JACKET.Title Summary field provided by Blackwell North America, Inc. All Rights Reserved

Handbook of Silicon Wafer Cleaning Technology 2nd Edition

Handbook of Silicon Wafer Cleaning Technology  2nd Edition Book
Author : Karen Reinhardt,Werner Kern
Publisher : William Andrew
Release : 2008-12-10
ISBN : 9780815517733
Language : En, Es, Fr & De

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Book Description :

The second Edition of the Handbook of Silicon Wafer Cleaning Technology is intended to provide knowledge of wet, plasma, and other surface conditioning techniques used to manufacture integrated circuits. The integration of the clean processes into the device manufacturing flow will be presented with respect to other manufacturing steps such as thermal, implant, etching, and photolithography processes. The Handbook discusses both wet and plasma-based cleaning technologies that are used for removing contamination, particles, residue, and photoresist from wafer surfaces. Both the process and the equipment are covered. A review of the current cleaning technologies is included. Also, advanced cleaning technologies that are under investigation for next generation processing are covered; including supercritical fluid, laser, and cryoaerosol cleaning techniques. Additionally theoretical aspects of the cleaning technologies and how these processes affect the wafer is discussed such as device damage and surface roughening will be discussed. The analysis of the wafers surface is outlined. A discussion of the new materials and the changes required for the surface conditioning process used for manufacturing is also included. Focused on silicon wafer cleaning techniques including wet, plasma, and other surface conditioning techniques used to manufacture integrated circuits As this book covers the major technologies for removing contaminants, it is a reliable reference for anyone that manufactures integrated circuits, or supplies the semiconductor and microelectronics industries Covers processes and equipment, as well as new materials and changes required for the surface conditioning process Editors are two of the top names in the field and are both extensively published Discusses next generation processing techniques including supercritical fluid, laser, and cryoaerosol

Handbook of Silicon Based MEMS Materials and Technologies

Handbook of Silicon Based MEMS Materials and Technologies Book
Author : Markku Tilli,Mervi Paulasto-Krockel,Veli-Matti Airaksinen,Sami Franssila,Veikko Lindroos,Ari Lehto,Teruaki Motooka
Publisher : Elsevier
Release : 2009-12-08
ISBN : 9780815519881
Language : En, Es, Fr & De

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Book Description :

A comprehensive guide to MEMS materials, technologies and manufacturing, examining the state of the art with a particular emphasis on current and future applications. Key topics covered include: Silicon as MEMS material Material properties and measurement techniques Analytical methods used in materials characterization Modeling in MEMS Measuring MEMS Micromachining technologies in MEMS Encapsulation of MEMS components Emerging process technologies, including ALD and porous silicon Written by 73 world class MEMS contributors from around the globe, this volume covers materials selection as well as the most important process steps in bulk micromachining, fulfilling the needs of device design engineers and process or development engineers working in manufacturing processes. It also provides a comprehensive reference for the industrial R&D and academic communities. Veikko Lindroos is Professor of Physical Metallurgy and Materials Science at Helsinki University of Technology, Finland. Markku Tilli is Senior Vice President of Research at Okmetic, Vantaa, Finland. Ari Lehto is Professor of Silicon Technology at Helsinki University of Technology, Finland. Teruaki Motooka is Professor at the Department of Materials Science and Engineering, Kyushu University, Japan. Provides vital packaging technologies and process knowledge for silicon direct bonding, anodic bonding, glass frit bonding, and related techniques Shows how to protect devices from the environment and decrease package size for dramatic reduction of packaging costs Discusses properties, preparation, and growth of silicon crystals and wafers Explains the many properties (mechanical, electrostatic, optical, etc), manufacturing, processing, measuring (incl. focused beam techniques), and multiscale modeling methods of MEMS structures

Handbook of Semiconductor Manufacturing Technology

Handbook of Semiconductor Manufacturing Technology Book
Author : Yoshio Nishi,Robert Doering
Publisher : CRC Press
Release : 2000-08-09
ISBN : 9780824787837
Language : En, Es, Fr & De

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Book Description :

The Handbook of Semiconductor Manufacturing Technology describes the individual processes and manufacturing control, support, and infrastructure technologies of silicon-based integrated-circuit manufacturing, many of which are also applicable for building devices on other semiconductor substrates. Discussing ion implantation, rapid thermal processing, photomask fabrication, chip testing, and plasma etching, the editors explore current and anticipated equipment, devices, materials, and practices of silicon-based manufacturing. The book includes a foreword by Jack S. Kilby, cowinner of the Nobel Prize in Physics 2000 "for his part in the invention of the integrated circuit."

Cleaning Technology in Semiconductor Device Manufacturing

Cleaning Technology in Semiconductor Device Manufacturing Book
Author : Richard E. Novak
Publisher : The Electrochemical Society
Release : 2000
ISBN : 9781566772594
Language : En, Es, Fr & De

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Book Description :

Download Cleaning Technology in Semiconductor Device Manufacturing book written by Richard E. Novak, available in PDF, EPUB, and Kindle, or read full book online anywhere and anytime. Compatible with any devices.

Ultra Clean Technology Handbook

Ultra Clean Technology Handbook Book
Author : Ohmi
Publisher : CRC Press
Release : 1993-06-29
ISBN : 9780824787530
Language : En, Es, Fr & De

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Book Description :

Evaluating the effectiveness of conventional wet processes for cleaning silicon wafers in semiconductor production, this reference reveals concrete measures to improve ultrapure water quality reviewing the structure and physical characteristics of ultrapure water molecules. The volume is divided int

Handbook of Silicon Based MEMS Materials and Technologies

Handbook of Silicon Based MEMS Materials and Technologies Book
Author : Markku Tilli,Mervi Paulasto-Krockel,Teruaki Motooka,Veikko Lindroos
Publisher : William Andrew
Release : 2015-09-02
ISBN : 0323312233
Language : En, Es, Fr & De

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Book Description :

The Handbook of Silicon Based MEMS Materials and Technologies, Second Edition, is a comprehensive guide to MEMS materials, technologies, and manufacturing that examines the state-of-the-art with a particular emphasis on silicon as the most important starting material used in MEMS. The book explains the fundamentals, properties (mechanical, electrostatic, optical, etc.), materials selection, preparation, manufacturing, processing, system integration, measurement, and materials characterization techniques, sensors, and multi-scale modeling methods of MEMS structures, silicon crystals, and wafers, also covering micromachining technologies in MEMS and encapsulation of MEMS components. Furthermore, it provides vital packaging technologies and process knowledge for silicon direct bonding, anodic bonding, glass frit bonding, and related techniques, shows how to protect devices from the environment, and provides tactics to decrease package size for a dramatic reduction in costs. Provides vital packaging technologies and process knowledge for silicon direct bonding, anodic bonding, glass frit bonding, and related techniques Shows how to protect devices from the environment and decrease package size for a dramatic reduction in packaging costs Discusses properties, preparation, and growth of silicon crystals and wafers Explains the many properties (mechanical, electrostatic, optical, etc.), manufacturing, processing, measuring (including focused beam techniques), and multiscale modeling methods of MEMS structures Geared towards practical applications rather than theory

Developments in Surface Contamination and Cleaning Methods for Surface Cleaning

Developments in Surface Contamination and Cleaning  Methods for Surface Cleaning Book
Author : Rajiv Kohli,Kashmiri L. Mittal
Publisher : William Andrew
Release : 2016-11-04
ISBN : 0323431720
Language : En, Es, Fr & De

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Book Description :

Developments in Surface Contamination and Cleaning: Methods for Surface Cleaning, Volume 9, part of the Developments in Surface Contamination and Cleaning series provide a state-of-the-art guide to the current knowledge on the behavior of film-type and particulate surface contaminants and their associated cleaning methods. This newest volume in the series discusses methods of surface cleaning of contaminants and the resources that are needed to deal with them. Taken as a whole, the series forms a unique reference for professionals and academics working in the area of surface contamination and cleaning. A strong theme running through the series is that of surface contamination and cleaning at the micro and nano scales. Provides a comprehensive coverage of innovations in surface cleaning Written by established experts in the surface cleaning field, presenting an authoritative resource Contains a comprehensive review of the state-of-the-art, including case studies to enhance the learning process

Handbook for Cleaning for Semiconductor Manufacturing

Handbook for Cleaning for Semiconductor Manufacturing Book
Author : Karen A. Reinhardt,Richard F. Reidy
Publisher : John Wiley & Sons
Release : 2011-04-12
ISBN : 9781118099513
Language : En, Es, Fr & De

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Book Description :

This comprehensive volume provides an in-depth discussion of the fundamentals of cleaning and surface conditioning of semiconductor applications such as high-k/metal gate cleaning, copper/low-k cleaning, high dose implant stripping, and silicon and SiGe passivation. The theory and fundamental physics associated with wet etching and wet cleaning is reviewed, plus the surface and colloidal aspects of wet processing. Formulation development practices and methodology are presented along with the applications for preventing copper corrosion, cleaning aluminum lines, and other sensitive layers. This is a must-have reference for any engineer or manager associated with using or supplying cleaning and contamination free technologies for semiconductor manufacturing. From the Reviews... "This handbook will be a valuable resource for many academic libraries. Many engineering librarians who work with a variety of programs (including, but not limited to Materials Engineering) should include this work in their collection. My recommendation is to add this work to any collection that serves a campus with a materials/manufacturing/electrical/computer engineering programs and campuses with departments of physics and/or chemistry with large graduate-level enrollment." —Randy Wallace, Department Head, Discovery Park Library, University of North Texas

Developments in Surface Contamination and Cleaning Volume 8

Developments in Surface Contamination and Cleaning  Volume 8 Book
Author : Rajiv Kohli,Kashmiri L. Mittal
Publisher : William Andrew
Release : 2015-06-03
ISBN : 0323312713
Language : En, Es, Fr & De

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Book Description :

As device sizes in the semiconductor industries shrink, devices become more vulnerable to smaller contaminant particles, and most conventional cleaning techniques employed in the industry are not effective at smaller scales. The book series Developments in Surface Contamination and Cleaning as a whole provides an excellent source of information on these alternative cleaning techniques as well as methods for characterization and validation of surface contamination. Each volume has a particular topical focus, covering the key techniques and recent developments in the area. Several novel wet and dry surface cleaning methods are addressed in this Volume. Many of these methods have not been reviewed previously, or the previous reviews are dated. These methods are finding increasing commercial application and the information in this book will be of high value to the reader. Edited by the leading experts in small-scale particle surface contamination, cleaning and cleaning control these books will be an invaluable reference for researchers and engineers in R&D, manufacturing, quality control and procurement specification situated in a multitude of industries such as: aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. Provides a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination Addresses the continuing trends of shrinking device size and contamination vulnerability in a range of industries, spearheaded by the semiconductor industry and others Covers novel wet and dry surface cleaning methods of increasing commercial importance

Advances in Chemical Mechanical Planarization CMP

Advances in Chemical Mechanical Planarization  CMP  Book
Author : Suryadevara Babu
Publisher : Woodhead Publishing
Release : 2021-09-24
ISBN : 0128218193
Language : En, Es, Fr & De

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Book Description :

Advances in Chemical Mechanical Planarization (CMP), Second Edition provides the latest information on a mainstream process that is critical for high-volume, high-yield semiconductor manufacturing, and even more so as device dimensions continue to shrink. The second edition includes the recent advances of CMP and its emerging materials, methods, and applications, including coverage of post-CMP cleaning challenges and tribology of CMP. This important book offers a systematic review of fundamentals and advances in the area. Part one covers CMP of dielectric and metal films, with chapters focusing on the use of current and emerging techniques and processes and on CMP of various materials, including ultra low-k materials and high-mobility channel materials, and ending with a chapter reviewing the environmental impacts of CMP processes. New content addressed includes CMP challenges with tungsten, cobalt, and ruthenium as interconnect and barrier films, consumables for ultralow topography and CMP for memory devices. Part two addresses consumables and process control for improved CMP and includes chapters on CMP pads, diamond disc pad conditioning, the use of FTIR spectroscopy for characterization of surface processes and approaches for defection characterization, mitigation, and reduction. Advances in Chemical Mechanical Planarization (CMP), Second Edition is an invaluable resource and key reference for materials scientists and engineers in academia and R&D. Reviews the most relevant techniques and processes for CMP of dielectric and metal films Includes chapters devoted to CMP for current and emerging materials Addresses consumables and process control for improved CMP, including post-CMP

Semiconductors

Semiconductors Book
Author : Martin I. Pech-Canul,Nuggehalli M. Ravindra
Publisher : Springer
Release : 2019-01-17
ISBN : 3030021718
Language : En, Es, Fr & De

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Book Description :

This book is a practical guide to optical, optoelectronic, and semiconductor materials and provides an overview of the topic from its fundamentals to cutting-edge processing routes to groundbreaking technologies for the most recent applications. The book details the characterization and properties of these materials. Chemical methods of synthesis are emphasized by the authors throughout the publication. Describes new materials and updates to older materials that exhibit optical, optoelectronic and semiconductor behaviors; Covers the structural and mechanical aspects of the optical, optoelectronic and semiconductor materials for meeting mechanical property and safety requirements; Includes discussion of the environmental and sustainability issues regarding optical, optoelectronic, and semiconductor materials, from processing to recycling.

Developments in Surface Contamination and Cleaning Applications of Cleaning Techniques

Developments in Surface Contamination and Cleaning  Applications of Cleaning Techniques Book
Author : Rajiv Kohli,K.L. Mittal
Publisher : Elsevier
Release : 2018-11-27
ISBN : 0128155787
Language : En, Es, Fr & De

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Book Description :

Developments in Surface Contamination and Cleaning: Applications of Cleaning Techniques, Volume Eleven, part of the Developments in Surface Contamination and Cleaning series, provides a guide to recent advances in the application of cleaning techniques for the removal of surface contamination in various industries, such as aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. The material in this new edition compiles cleaning applications into one easy reference that has been fully updated to incorporate new applications and techniques. Taken as a whole, the series forms a unique reference for professionals and academics working in the area of surface contamination and cleaning. Presents the latest reviewed technical information on precision cleaning applications as written by established experts in the field Provides a single source on the applications of innovative precision cleaning techniques for a wide variety of industries Serves as a guide to the selection of precision cleaning techniques for specific applications

Nanoelectronics

Nanoelectronics Book
Author : Robert Puers,Livio Baldi,Marcel Van de Voorde,Sebastiaan E. van Nooten
Publisher : John Wiley & Sons
Release : 2017-04-11
ISBN : 3527800719
Language : En, Es, Fr & De

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Book Description :

Offering first-hand insights by top scientists and industry experts at the forefront of R&D into nanoelectronics, this book neatly links the underlying technological principles with present and future applications. A brief introduction is followed by an overview of present and emerging logic devices, memories and power technologies. Specific chapters are dedicated to the enabling factors, such as new materials, characterization techniques, smart manufacturing and advanced circuit design. The second part of the book provides detailed coverage of the current state and showcases real future applications in a wide range of fields: safety, transport, medicine, environment, manufacturing, and social life, including an analysis of emerging trends in the internet of things and cyber-physical systems. A survey of main economic factors and trends concludes the book. Highlighting the importance of nanoelectronics in the core fields of communication and information technology, this is essential reading for materials scientists, electronics and electrical engineers, as well as those working in the semiconductor and sensor industries.

Particles on Surfaces Five and Six

Particles on Surfaces Five and Six Book
Author : Kashmiri Lal Mittal
Publisher : VSP
Release : 1999-09
ISBN : 9789067643122
Language : En, Es, Fr & De

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Book Description :

This volume documents the Proceedings of the 5th and 6th Symposia on Particles on Surfaces: Detection, Adhesion and Removal, held under the aegis of the Fine Particle Society in Chicago (May 6--9, 1996) and Dallas (April 1--3, 1998), respectively. The technical programs clearly reflected an interest and need to ameliorate the existing methods and to devise new and more efficient ways to detect, analyze and characterize particles on surfaces. The removal of particles from a host of surfaces was especially highlighted; the need to remove smaller and smaller particles was particularly underscored. All manuscripts included in this volume were properly peer reviewed and all were revised before inclusion in this volume. Thus, this book is not a mere collection of unreviewed papers, but represents information that has passed peer scrutiny. Furthermore, the authors of the 5th Symposium were asked to update the information. So, the information presented in this book should be as fresh and up-to-date as possible. This volume is divided into two parts: Part 1. General Papers and Part 2. Particle Adhesion and Removal. The topics covered include: high-sensitivity rapid detection of particles; detection of particles using evanescent wave scattering; particles on the backside of wafers; particle shedding from fluid-handling components; dynamics of particle adhesion; particle dispersion/aggregation; precision cleaning; and particle removal by surfactants, supercritical fluids, hydrodynamic forces, high-speed droplet impinging, megasonic, CO2 blasting, CO2 snow, argon aerosol, lasers, microcluster beams, brush and chemical-mechanical methods. This volume offers bountiful information and represent a current commentary on the R&D activity taking place in the area of particles on surfaces, particularly particle removal from a variety of surfaces.

Case Studies in Micromechatronics

Case Studies in Micromechatronics Book
Author : Stephanus Büttgenbach,Iordania Constantinou,Andreas Dietzel,Monika Leester-Schädel
Publisher : Springer Nature
Release : 2020-05-15
ISBN : 3662613204
Language : En, Es, Fr & De

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Book Description :

The book “Case Studies in Micromechatronics – From Systems to Process” offers prominent sample applications of micromechatronic systems and the enabling fabrication technologies. The chosen examples represent five main fields of application: consumer electronics (pressure sensor), mobility and navigation (acceleration sensor), handling technology and automation (micro gripper), laboratory diagnostics (point of care system), and biomedical technology (smart skin). These five sample systems are made from different materials requiring a large variety of modern fabrication methods and design rules, which are explained in detail. As a result, an inverted introduction “from prominent applications to base technologies” is provided. Examples of applications are selected to offer a broad overview of the development environment of micromechatronic systems including established as well as cutting-edge microfabrication technologies.

Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing

Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing Book
Author : Jerzy Rużyłło
Publisher : The Electrochemical Society
Release : 1998
ISBN : 9781566771887
Language : En, Es, Fr & De

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Book Description :

Download Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing book written by Jerzy Rużyłło, available in PDF, EPUB, and Kindle, or read full book online anywhere and anytime. Compatible with any devices.

Semiconductor Wafer Bonding Science Technology and Applications 15

Semiconductor Wafer Bonding  Science  Technology  and Applications 15 Book
Author : C. S. Tan,T. Suga,H. Baumgart,F. Fournel,M. Goorsky,K. D. Hobart,R. Knechtel
Publisher : The Electrochemical Society
Release : 2018-09-21
ISBN : 1607688514
Language : En, Es, Fr & De

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Book Description :

Download Semiconductor Wafer Bonding Science Technology and Applications 15 book written by C. S. Tan,T. Suga,H. Baumgart,F. Fournel,M. Goorsky,K. D. Hobart,R. Knechtel, available in PDF, EPUB, and Kindle, or read full book online anywhere and anytime. Compatible with any devices.