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Handbook Of Silicon Wafer Cleaning Technology

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Handbook of Silicon Wafer Cleaning Technology

Handbook of Silicon Wafer Cleaning Technology Book
Author : Karen Reinhardt,Werner Kern
Publisher : William Andrew
Release : 2018-03-16
ISBN : 032351085X
Language : En, Es, Fr & De

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Book Description :

Handbook of Silicon Wafer Cleaning Technology, Third Edition, provides an in-depth discussion of cleaning, etching and surface conditioning for semiconductor applications. The fundamental physics and chemistry associated with wet and plasma processing are reviewed, including surface and colloidal aspects. This revised edition includes the developments of the last ten years to accommodate a continually involving industry, addressing new technologies and materials, such as germanium and III-V compound semiconductors, and reviewing the various techniques and methods for cleaning and surface conditioning. Chapters include numerous examples of cleaning technique and their results. The book helps the reader understand the process they are using for their cleaning application and why the selected process works. For example, discussion of the mechanism and physics of contamination, metal, particle and organic includes information on particle removal, metal passivation, hydrogen-terminated silicon and other processes that engineers experience in their working environment. In addition, the handbook assists the reader in understanding analytical methods for evaluating contamination. The book is arranged in an order that segments the various cleaning techniques, aqueous and dry processing. Sections include theory, chemistry and physics first, then go into detail for the various methods of cleaning, specifically particle removal and metal removal, amongst others. Focuses on cleaning techniques including wet, plasma and other surface conditioning techniques used to manufacture integrated circuits Reliable reference for anyone that manufactures integrated circuits or supplies the semiconductor and microelectronics industries Covers processes and equipment, as well as new materials and changes required for the surface conditioning process

Handbook of Silicon Wafer Cleaning Technology

Handbook of Silicon Wafer Cleaning Technology Book
Author : Karen A. Reinhardt,Werner Kern
Publisher : Noyes Publications
Release : 2008
ISBN : 9780815515548
Language : En, Es, Fr & De

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Book Description :

Now updated, this handbook addresses wet, plasma, and other surface conditioning techniques used to manufacture integrated circuits. It discusses both wet and plasma-based cleaning technologies that are used for removing contamination, particles, and residue from wafer surfaces.

Handbook of Silicon Wafer Cleaning Technology 2nd Edition

Handbook of Silicon Wafer Cleaning Technology  2nd Edition Book
Author : Karen Reinhardt,Werner Kern
Publisher : William Andrew
Release : 2008-12-10
ISBN : 0815517734
Language : En, Es, Fr & De

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Book Description :

The second Edition of the Handbook of Silicon Wafer Cleaning Technology is intended to provide knowledge of wet, plasma, and other surface conditioning techniques used to manufacture integrated circuits. The integration of the clean processes into the device manufacturing flow will be presented with respect to other manufacturing steps such as thermal, implant, etching, and photolithography processes. The Handbook discusses both wet and plasma-based cleaning technologies that are used for removing contamination, particles, residue, and photoresist from wafer surfaces. Both the process and the equipment are covered. A review of the current cleaning technologies is included. Also, advanced cleaning technologies that are under investigation for next generation processing are covered; including supercritical fluid, laser, and cryoaerosol cleaning techniques. Additionally theoretical aspects of the cleaning technologies and how these processes affect the wafer is discussed such as device damage and surface roughening will be discussed. The analysis of the wafers surface is outlined. A discussion of the new materials and the changes required for the surface conditioning process used for manufacturing is also included. Focused on silicon wafer cleaning techniques including wet, plasma, and other surface conditioning techniques used to manufacture integrated circuits As this book covers the major technologies for removing contaminants, it is a reliable reference for anyone that manufactures integrated circuits, or supplies the semiconductor and microelectronics industries Covers processes and equipment, as well as new materials and changes required for the surface conditioning process Editors are two of the top names in the field and are both extensively published Discusses next generation processing techniques including supercritical fluid, laser, and cryoaerosol

Handbook of Semiconductor Wafer Cleaning Technology

Handbook of Semiconductor Wafer Cleaning Technology Book
Author : Werner Kern
Publisher : William Andrew
Release : 1993
ISBN : 0987650XXX
Language : En, Es, Fr & De

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Book Description :

"The cleaning of semiconductor wafers has become one of the most critical operations in the fabrication of semiconductor devices. The considerable body of technical and scientific literature is widely dispersed in numerous journals and symposia proceedings. This book brings together in one volume all pertinent knowledge on semiconductor wafer cleaning and its associated scientific and technical disciplines. It provides the first comprehensive and up-to-date coverage of this rapidly evolving field. Its thirteen chapters were written by nineteen scientists who are recognized experts in each topic." "The scope of this book is very broad, covering all aspects of wafer cleaning. Emphasis is on practical applications in the fab combined with authoritative scientific background information to provide a solid scientific basis for understanding the chemical and physical processes involved in cleaning and in the analytical methods of testing and evaluation." "The depth and breadth of the material should appeal to those new in the field as well as to experienced professionals. The volume is intended to serve as a handbook for practitioners and professionals in the field of semiconductor microelectronics, including fab engineers, scientists and technicians. It should also prove useful to manufacturers of processing equipment, persons concerned with contamination control and analysis, and students attending advanced or specialized technical courses."--BOOK JACKET.Title Summary field provided by Blackwell North America, Inc. All Rights Reserved

Handbook of Silicon Wafer Cleaning Technology 2nd Edition

Handbook of Silicon Wafer Cleaning Technology  2nd Edition Book
Author : Karen Reinhardt,Werner Kern
Publisher : William Andrew
Release : 2008-12-10
ISBN : 9780815517733
Language : En, Es, Fr & De

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Book Description :

The second Edition of the Handbook of Silicon Wafer Cleaning Technology is intended to provide knowledge of wet, plasma, and other surface conditioning techniques used to manufacture integrated circuits. The integration of the clean processes into the device manufacturing flow will be presented with respect to other manufacturing steps such as thermal, implant, etching, and photolithography processes. The Handbook discusses both wet and plasma-based cleaning technologies that are used for removing contamination, particles, residue, and photoresist from wafer surfaces. Both the process and the equipment are covered. A review of the current cleaning technologies is included. Also, advanced cleaning technologies that are under investigation for next generation processing are covered; including supercritical fluid, laser, and cryoaerosol cleaning techniques. Additionally theoretical aspects of the cleaning technologies and how these processes affect the wafer is discussed such as device damage and surface roughening will be discussed. The analysis of the wafers surface is outlined. A discussion of the new materials and the changes required for the surface conditioning process used for manufacturing is also included. Focused on silicon wafer cleaning techniques including wet, plasma, and other surface conditioning techniques used to manufacture integrated circuits As this book covers the major technologies for removing contaminants, it is a reliable reference for anyone that manufactures integrated circuits, or supplies the semiconductor and microelectronics industries Covers processes and equipment, as well as new materials and changes required for the surface conditioning process Editors are two of the top names in the field and are both extensively published Discusses next generation processing techniques including supercritical fluid, laser, and cryoaerosol

Handbook of Silicon Based MEMS Materials and Technologies

Handbook of Silicon Based MEMS Materials and Technologies Book
Author : Markku Tilli,Mervi Paulasto-Krockel,Veli-Matti Airaksinen,Sami Franssila,Veikko Lindroos,Ari Lehto,Teruaki Motooka
Publisher : Elsevier
Release : 2009-12-08
ISBN : 9780815519881
Language : En, Es, Fr & De

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Book Description :

A comprehensive guide to MEMS materials, technologies and manufacturing, examining the state of the art with a particular emphasis on current and future applications. Key topics covered include: Silicon as MEMS material Material properties and measurement techniques Analytical methods used in materials characterization Modeling in MEMS Measuring MEMS Micromachining technologies in MEMS Encapsulation of MEMS components Emerging process technologies, including ALD and porous silicon Written by 73 world class MEMS contributors from around the globe, this volume covers materials selection as well as the most important process steps in bulk micromachining, fulfilling the needs of device design engineers and process or development engineers working in manufacturing processes. It also provides a comprehensive reference for the industrial R&D and academic communities. Veikko Lindroos is Professor of Physical Metallurgy and Materials Science at Helsinki University of Technology, Finland. Markku Tilli is Senior Vice President of Research at Okmetic, Vantaa, Finland. Ari Lehto is Professor of Silicon Technology at Helsinki University of Technology, Finland. Teruaki Motooka is Professor at the Department of Materials Science and Engineering, Kyushu University, Japan. Provides vital packaging technologies and process knowledge for silicon direct bonding, anodic bonding, glass frit bonding, and related techniques Shows how to protect devices from the environment and decrease package size for dramatic reduction of packaging costs Discusses properties, preparation, and growth of silicon crystals and wafers Explains the many properties (mechanical, electrostatic, optical, etc), manufacturing, processing, measuring (incl. focused beam techniques), and multiscale modeling methods of MEMS structures

Handbook for Cleaning for Semiconductor Manufacturing

Handbook for Cleaning for Semiconductor Manufacturing Book
Author : Karen A. Reinhardt,Richard F. Reidy
Publisher : John Wiley & Sons
Release : 2011-04-12
ISBN : 9781118099513
Language : En, Es, Fr & De

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Book Description :

This comprehensive volume provides an in-depth discussion of the fundamentals of cleaning and surface conditioning of semiconductor applications such as high-k/metal gate cleaning, copper/low-k cleaning, high dose implant stripping, and silicon and SiGe passivation. The theory and fundamental physics associated with wet etching and wet cleaning is reviewed, plus the surface and colloidal aspects of wet processing. Formulation development practices and methodology are presented along with the applications for preventing copper corrosion, cleaning aluminum lines, and other sensitive layers. This is a must-have reference for any engineer or manager associated with using or supplying cleaning and contamination free technologies for semiconductor manufacturing. From the Reviews... "This handbook will be a valuable resource for many academic libraries. Many engineering librarians who work with a variety of programs (including, but not limited to Materials Engineering) should include this work in their collection. My recommendation is to add this work to any collection that serves a campus with a materials/manufacturing/electrical/computer engineering programs and campuses with departments of physics and/or chemistry with large graduate-level enrollment." —Randy Wallace, Department Head, Discovery Park Library, University of North Texas

Handbook for Cleaning for Semiconductor Manufacturing

Handbook for Cleaning for Semiconductor Manufacturing Book
Author : Karen A. Reinhardt,Richard F. Reidy
Publisher : Wiley-Scrivener
Release : 2011-01-11
ISBN : 9780470625958
Language : En, Es, Fr & De

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Book Description :

This comprehensive volume provides an in-depth discussion of the fundamentals of cleaning and surface conditioning of semiconductor applications such as high-k/metal gate cleaning, copper/low-k cleaning, high dose implant stripping, and silicon and SiGe passivation. The theory and fundamental physics associated with wet etching and wet cleaning is reviewed, plus the surface and colloidal aspects of wet processing. Formulation development practices and methodology are presented along with the applications for preventing copper corrosion, cleaning aluminum lines, and other sensitive layers. This is a must-have reference for any engineer or manager associated with using or supplying cleaning and contamination free technologies for semiconductor manufacturing. From the Reviews... "This handbook will be a valuable resource for many academic libraries. Many engineering librarians who work with a variety of programs (including, but not limited to Materials Engineering) should include this work in their collection. My recommendation is to add this work to any collection that serves a campus with a materials/manufacturing/electrical/computer engineering programs and campuses with departments of physics and/or chemistry with large graduate-level enrollment." —Randy Wallace, Department Head, Discovery Park Library, University of North Texas

Laser Applications in Microelectronic and Optoelectronic Manufacturing

Laser Applications in Microelectronic and Optoelectronic Manufacturing Book
Author : Anonim
Publisher : Unknown
Release : 1999
ISBN : 0987650XXX
Language : En, Es, Fr & De

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Book Description :

Download Laser Applications in Microelectronic and Optoelectronic Manufacturing book written by , available in PDF, EPUB, and Kindle, or read full book online anywhere and anytime. Compatible with any devices.

Semiconductor International

Semiconductor International Book
Author : Anonim
Publisher : Unknown
Release : 2007
ISBN : 0987650XXX
Language : En, Es, Fr & De

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Book Description :

Download Semiconductor International book written by , available in PDF, EPUB, and Kindle, or read full book online anywhere and anytime. Compatible with any devices.

Ultra Clean Processing of Semiconductor Surfaces XIII

Ultra Clean Processing of Semiconductor Surfaces XIII Book
Author : Paul W. Mertens,Marc Meuris,Marc Heyns
Publisher : Trans Tech Publications Ltd
Release : 2016-09-05
ISBN : 3035730849
Language : En, Es, Fr & De

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Book Description :

This volume contains the proceedings of 13th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS 2016, Knokke, Belgium, September 12-14, 2016) (www.ucpss.org) and includes studies on cleaning such as particle removal using acoustic enhancement, removal of metallic contamination, pattern collapse of fine flexible and fragile features, wetting and drying issues, control and measuring of contamination . FEOL and BEOL topics cover: chemistry of semiconductor surfaces, cleaning related to new gate stacks, cleaning at the interconnect level, selective wet etching, resist strip and polymer removal, cleaning and contamination control for various new materials and cleaning after Chemical-Mechanical-Polishing (CMP).

Handbook of Semiconductor Manufacturing Technology

Handbook of Semiconductor Manufacturing Technology Book
Author : Yoshio Nishi,Robert Doering
Publisher : CRC Press
Release : 2017-12-19
ISBN : 1420017667
Language : En, Es, Fr & De

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Book Description :

Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.

Ultra Clean Processing of Semiconductor Surfaces XIV

Ultra Clean Processing of Semiconductor Surfaces XIV Book
Author : Paul Mertens,Marc Meuris,Marc Heyns
Publisher : Trans Tech Publications Ltd
Release : 2018-08-31
ISBN : 3035734178
Language : En, Es, Fr & De

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Book Description :

The 14th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (14th UCPSS 2018, Leuven, Belgium, September 3-5, 2018) was organized by IMEC and the scope of this symposium includes all issues related to contamination, cleaning and surface preparation in mainstream large-scale Integrated Circuit manufacturing. This collection will be interesting and useful for experts in the field of microelectronics.

Ultra Clean Technology Handbook

Ultra Clean Technology Handbook Book
Author : Ohmi
Publisher : CRC Press
Release : 1993-06-29
ISBN : 9780824787530
Language : En, Es, Fr & De

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Book Description :

Evaluating the effectiveness of conventional wet processes for cleaning silicon wafers in semiconductor production, this reference reveals concrete measures to improve ultrapure water quality reviewing the structure and physical characteristics of ultrapure water molecules. The volume is divided int

Japanese Journal of Applied Physics

Japanese Journal of Applied Physics Book
Author : Anonim
Publisher : Unknown
Release : 2004
ISBN : 0987650XXX
Language : En, Es, Fr & De

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Book Description :

Download Japanese Journal of Applied Physics book written by , available in PDF, EPUB, and Kindle, or read full book online anywhere and anytime. Compatible with any devices.

Gettering and Defect Engineering in Semiconductor Technology XV

Gettering and Defect Engineering in Semiconductor Technology XV Book
Author : J.D. Murphy
Publisher : Trans Tech Publications Ltd
Release : 2013-10-07
ISBN : 3038262056
Language : En, Es, Fr & De

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Book Description :

The book includes both fundamental and technological aspects of defects in semiconductor materials and devices, including photovoltaics. Volume is indexed by Thomson Reuters CPCI-S (WoS). The 74 papers are grouped as follows: I. Defect engineering in silicon solar cells; II. Structural and production issues in cast silicon materials for solar cells; III. Characterisation of silicon for solar cells; IV. Intrinsic point defects in silicon; V. Light impurities in silicon-based materials; VI. Metals in silicon: fundamental properties and gettering; VII. Extended and implantation-related defects in silicon; VIII. Surfaces, passivation and processing; IX. Germanium-based devices and materials; X. Semiconductors other than silicon and germanium; XI. Nanostructures and new materials systems.

Lateral Solid Phase Epitaxy of Silicon and Application to the Fabrication of Metal Oxide Semiconductor Field Effect Transistors

Lateral Solid Phase Epitaxy of Silicon and Application to the Fabrication of Metal Oxide Semiconductor Field Effect Transistors Book
Author : Brian Joseph Greene
Publisher : Unknown
Release : 2003
ISBN : 0987650XXX
Language : En, Es, Fr & De

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Book Description :

Download Lateral Solid Phase Epitaxy of Silicon and Application to the Fabrication of Metal Oxide Semiconductor Field Effect Transistors book written by Brian Joseph Greene, available in PDF, EPUB, and Kindle, or read full book online anywhere and anytime. Compatible with any devices.

Meeting Abstracts

Meeting Abstracts Book
Author : Electrochemical Society
Publisher : Unknown
Release : 1998
ISBN : 0987650XXX
Language : En, Es, Fr & De

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Book Description :

Download Meeting Abstracts book written by Electrochemical Society, available in PDF, EPUB, and Kindle, or read full book online anywhere and anytime. Compatible with any devices.

Solar Cells Research and Development of Solar Cells

Solar Cells  Research and Development of Solar Cells Book
Author : Stanislav Kolisnychenko
Publisher : Trans Tech Publications Ltd
Release : 2015-07-31
ISBN : 3038269417
Language : En, Es, Fr & De

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Book Description :

Solar energy possesses enormous potential as a source of affordable and inexhaustible energy. Solar energy is utilized with the help of various technologies and, in particular, photovoltaic technology, based on photovoltaic elements which provide direct conversion of solar energy into electricity. The compilation “Research and Development of Solar Cells” covers papers concerning various aspects of the design, research and manufacture of photovoltaic cells, as they have been selected from the library of Trans Tech Publications Inc. from 2010 to 2014 inclusive. All materials are presented in five chapters: Chapter 1: Silicon Based Solar Cells Chapter 2: Dye-Sensitized Cells Chapter 3: Other Types of Solar Cells Chapter 4: Technology of Quantum Dots Chapter 5: Engineering Support in Manufacturing of Solar Cells, which display a wide variety of challenges and achievements in the field of photovoltaic cells engineering.

Evolution of Silicon Surface Morphologies During Aqueous Fluorine Etching

Evolution of Silicon Surface Morphologies During Aqueous Fluorine Etching Book
Author : Yi-Chiau Huang
Publisher : Unknown
Release : 2000
ISBN : 0987650XXX
Language : En, Es, Fr & De

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Book Description :

Etching in NH4F also produces macroscopic, dislocation-related etch pits on Si(111) surfaces. These pits are pyramidal and shallow. Aqueous fluorine etching therefore offers an alternative to hazardous, chromium-containing dislocation etchants.