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Advances In Chemical Mechanical Planarization Cmp

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Advances in Chemical Mechanical Planarization CMP

Advances in Chemical Mechanical Planarization  CMP  Book
Author : Suryadevara Babu
Publisher : Woodhead Publishing
Release : 2021-09-24
ISBN : 0128218193
Language : En, Es, Fr & De

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Book Description :

Advances in Chemical Mechanical Planarization (CMP), Second Edition provides the latest information on a mainstream process that is critical for high-volume, high-yield semiconductor manufacturing, and even more so as device dimensions continue to shrink. The second edition includes the recent advances of CMP and its emerging materials, methods, and applications, including coverage of post-CMP cleaning challenges and tribology of CMP. This important book offers a systematic review of fundamentals and advances in the area. Part one covers CMP of dielectric and metal films, with chapters focusing on the use of current and emerging techniques and processes and on CMP of various materials, including ultra low-k materials and high-mobility channel materials, and ending with a chapter reviewing the environmental impacts of CMP processes. New content addressed includes CMP challenges with tungsten, cobalt, and ruthenium as interconnect and barrier films, consumables for ultralow topography and CMP for memory devices. Part two addresses consumables and process control for improved CMP and includes chapters on CMP pads, diamond disc pad conditioning, the use of FTIR spectroscopy for characterization of surface processes and approaches for defection characterization, mitigation, and reduction. Advances in Chemical Mechanical Planarization (CMP), Second Edition is an invaluable resource and key reference for materials scientists and engineers in academia and R&D. Reviews the most relevant techniques and processes for CMP of dielectric and metal films Includes chapters devoted to CMP for current and emerging materials Addresses consumables and process control for improved CMP, including post-CMP

Advances in CMP Polishing Technologies

Advances in CMP Polishing Technologies Book
Author : Toshiro Doi,Ioan D. Marinescu,Syuhei Kurokawa
Publisher : William Andrew
Release : 2011-12-06
ISBN : 1437778593
Language : En, Es, Fr & De

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Book Description :

CMP and polishing are the most precise processes used to finish the surfaces of mechanical and electronic or semiconductor components. Advances in CMP/Polishing Technologies for Manufacture of Electronic Devices presents the latest developments and technological innovations in the field - making cutting-edge R&D accessible to the wider engineering community. Most of the applications of these processes are kept as confidential as possible (proprietary information), and specific details are not seen in professional or technical journals and magazines. This book makes these processes and applications accessible to a wider industrial and academic audience. Building on the fundamentals of tribology - the science of friction, wear and lubrication - the authors explore the practical applications of CMP and polishing across various market sectors. Due to the high pace of development of the electronics and semiconductors industry, many of the presented processes and applications come from these industries. Demystifies scientific developments and technological innovations, opening them up for new applications and process improvements in the semiconductor industry and other areas of precision engineering Explores stock removal mechanisms in CMP and polishing, and the challenges involved in predicting the outcomes of abrasive processes in high-precision environments The authors bring together the latest innovations and research from the USA and Japan

Abrasive Technology

Abrasive Technology Book
Author : Anna Rudawska
Publisher : BoD – Books on Demand
Release : 2018-10-24
ISBN : 1789841933
Language : En, Es, Fr & De

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Book Description :

The subject matter of this book is the information on the abrasive technology methods, the characteristics of the methods (for example, the technological parameters, tools, and machines), innovative methods, characteristics of surface structure and surface properties after this type of mechanical process, and application in various industrial branches and other technical and technological domains. Abrasive technology is very important, for example, in precision component manufacturing and nano-technology devices. The aim of this book is to present information on the characteristics and applications of abrasive technology, abrasive tools, tests, and also the innovative methods of this technology. This information enables scientists, engineers, and designers to ensure the soundness and integrity of the fabricated components and to develop new techniques effectively.

Handbook of Laser Welding Technologies

Handbook of Laser Welding Technologies Book
Author : S Katayama
Publisher : Elsevier
Release : 2013-06-30
ISBN : 0857098772
Language : En, Es, Fr & De

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Book Description :

Laser welding is a rapidly developing and versatile technology which has found increasing applications in industry and manufacturing. It allows the precision welding of small and hard-to-reach areas, and is particularly suitable for operation under computer or robotic control. The Handbook of laser welding technologies reviews the latest developments in the field and how they can be used across a variety of applications. Part one provides an introduction to the fundamentals of laser welding before moving on to explore developments in established technologies including CO2 laser welding, disk laser welding and laser micro welding technology. Part two highlights laser welding technologies for various materials including aluminium and titanium alloys, plastics and glass. Part three focuses on developments in emerging laser welding technologies with chapters on the applications of robotics in laser welding and developments in the modelling and simulation of laser and hybrid laser welding. Finally, part four explores the applications of laser welding in the automotive, railway and shipbuilding industries. The Handbook of laser welding technologies is a technical resource for researchers and engineers using laser welding technologies, professionals requiring an understanding of laser welding techniques and academics interested in the field. Provides an introduction to the fundamentals of laser welding including characteristics, welding defects and evolution of laser welding Discusses developments in a number of techniques including disk, conduction and laser micro welding Focusses on technologies for particular materials such as light metal alloys, plastics and glass

Chemical Mechanical Planarization of Semiconductor Materials

Chemical Mechanical Planarization of Semiconductor Materials Book
Author : M.R. Oliver
Publisher : Springer Science & Business Media
Release : 2004-01-26
ISBN : 9783540431817
Language : En, Es, Fr & De

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Book Description :

This book contains a comprehensive review of CMP (Chemical-Mechanical Planarization) technology, one of the most exciting areas in the field of semiconductor technology. It contains detailed discussions of all aspects of the technology, for both dielectrics and metals. The state of polishing models and their relation to experimental results are covered. Polishing tools and consumables are also covered. The leading edge issues of damascene and new dielectrics as well as slurryless technology are discussed.

Chemical Mechanical Planarization of Microelectronic Materials

Chemical Mechanical Planarization of Microelectronic Materials Book
Author : Joseph M. Steigerwald,Shyam P. Murarka,Ronald J. Gutmann
Publisher : John Wiley & Sons
Release : 2008-09-26
ISBN : 3527617752
Language : En, Es, Fr & De

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Book Description :

Chemical Mechanical Planarization (CMP) plays an important role in today's microelectronics industry. With its ability to achieve global planarization, its universality (material insensitivity), its applicability to multimaterial surfaces, and its relative cost-effectiveness, CMP is the ideal planarizing medium for the interlayered dielectrics and metal films used in silicon integrated circuit fabrication. But although the past decade has seen unprecedented research and development into CMP, there has been no single-source reference to this rapidly emerging technology-until now. Chemical Mechanical Planarization of Microelectronic Materials provides engineers and scientists working in the microelectronics industry with unified coverage of both the fundamental mechanisms and engineering applications of CMP. Authors Steigerwald, Murarka, and Gutmann-all leading CMP pioneers-provide a historical overview of CMP, explain the various chemical and mechanical concepts involved, describe CMP materials and processes, review the latest scientific data on CMP worldwide, and offer examples of its uses in the microelectronics industry. They provide detailed coverage of the CMP of various materials used in the making of microcircuitry: tungsten, aluminum, copper, polysilicon, and various dielectric materials, including polymers. The concluding chapter describes post-CMP cleaning techniques, and most chapters feature problem sets to assist readers in developing a more practical understanding of CMP. The only comprehensive reference to one of the fastest growing integrated circuit manufacturing technologies, Chemical Mechanical Planarization of Microelectronic Materials is an important resource for research scientists and engineers working in the microelectronics industry. An indispensable resource for scientists and engineers working in the microelectronics industry Chemical Mechanical Planarization of Microelectronic Materials is the only comprehensive single-source reference to one of the fastest growing integrated circuit manufacturing technologies. It provides engineers and scientists who work in the microelectronics industry with unified coverage of both the fundamental mechanisms and engineering applications of CMP, including: * The history of CMP * Chemical and mechanical underpinnings of CMP * CMP materials and processes * Applications of CMP in the microelectronics industry * The CMP of tungsten, aluminum, copper, polysilicon, and various dielectrics, including polymers used in integrated circuit fabrication * Post-CMP cleaning techniques * Chapter-end problem sets are also included to assist readers in developing a practical understanding of CMP.

Microelectronic Applications of Chemical Mechanical Planarization

Microelectronic Applications of Chemical Mechanical Planarization Book
Author : Yuzhuo Li
Publisher : John Wiley & Sons
Release : 2007-10-19
ISBN : 0471719196
Language : En, Es, Fr & De

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Book Description :

An authoritative, systematic, and comprehensive description of current CMP technology Chemical Mechanical Planarization (CMP) provides the greatest degree of planarization of any known technique. The current standard for integrated circuit (IC) planarization, CMP is playing an increasingly important role in other related applications such as microelectromechanical systems (MEMS) and computer hard drive manufacturing. This reference focuses on the chemical aspects of the technology and includes contributions from the foremost experts on specific applications. After a detailed overview of the fundamentals and basic science of CMP, Microelectronic Applications of Chemical Mechanical Planarization: * Provides in-depth coverage of a wide range of state-of-the-art technologies and applications * Presents information on new designs, capabilities, and emerging technologies, including topics like CMP with nanomaterials and 3D chips * Discusses different types of CMP tools, pads for IC CMP, modeling, and the applicability of tribometrology to various aspects of CMP * Covers nanotopography, CMP performance and defect profiles, CMP waste treatment, and the chemistry and colloidal properties of the slurries used in CMP * Provides a perspective on the opportunities and challenges of the next fifteen years Complete with case studies, this is a valuable, hands-on resource for professionals, including process engineers, equipment engineers, formulation chemists, IC manufacturers, and others. With systematic organization and questions at the end of each chapter to facilitate learning, it is an ideal introduction to CMP and an excellent text for students in advanced graduate courses that cover CMP or related semiconductor manufacturing processes.

Emerging Contaminants

Emerging Contaminants Book
Author : Aurel Nuro
Publisher : BoD – Books on Demand
Release : 2021-05-27
ISBN : 1839624183
Language : En, Es, Fr & De

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Book Description :

Emerging Contaminants presents the reader with information on classification, recent studies, and adverse effects on the environment and human health of the main classes of contaminants. Emerging contaminants are synthetic or natural compounds and microorganisms produced and used by humans that cause adverse ecological and human health effects when they reach the environment. This book is organized into four sections that cover the classification of contaminants and the instrumental techniques used to quantify them, recent studies on pesticides, antibiotics as an important group of emerging contaminants, and studies of different classes of emerging contaminants such as polybrominated diphenyl ethers (PBDEs), microplastics, and others.

Handbook of Silicon Wafer Cleaning Technology 2nd Edition

Handbook of Silicon Wafer Cleaning Technology  2nd Edition Book
Author : Karen Reinhardt,Werner Kern
Publisher : William Andrew
Release : 2008-12-10
ISBN : 0815517734
Language : En, Es, Fr & De

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Book Description :

The second Edition of the Handbook of Silicon Wafer Cleaning Technology is intended to provide knowledge of wet, plasma, and other surface conditioning techniques used to manufacture integrated circuits. The integration of the clean processes into the device manufacturing flow will be presented with respect to other manufacturing steps such as thermal, implant, etching, and photolithography processes. The Handbook discusses both wet and plasma-based cleaning technologies that are used for removing contamination, particles, residue, and photoresist from wafer surfaces. Both the process and the equipment are covered. A review of the current cleaning technologies is included. Also, advanced cleaning technologies that are under investigation for next generation processing are covered; including supercritical fluid, laser, and cryoaerosol cleaning techniques. Additionally theoretical aspects of the cleaning technologies and how these processes affect the wafer is discussed such as device damage and surface roughening will be discussed. The analysis of the wafers surface is outlined. A discussion of the new materials and the changes required for the surface conditioning process used for manufacturing is also included. Focused on silicon wafer cleaning techniques including wet, plasma, and other surface conditioning techniques used to manufacture integrated circuits As this book covers the major technologies for removing contaminants, it is a reliable reference for anyone that manufactures integrated circuits, or supplies the semiconductor and microelectronics industries Covers processes and equipment, as well as new materials and changes required for the surface conditioning process Editors are two of the top names in the field and are both extensively published Discusses next generation processing techniques including supercritical fluid, laser, and cryoaerosol

MEMS Materials and Processes Handbook

MEMS Materials and Processes Handbook Book
Author : Reza Ghodssi,Pinyen Lin
Publisher : Springer Science & Business Media
Release : 2011-03-18
ISBN : 0387473181
Language : En, Es, Fr & De

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Book Description :

MEMs Materials and Processes Handbook" is a comprehensive reference for researchers searching for new materials, properties of known materials, or specific processes available for MEMS fabrication. The content is separated into distinct sections on "Materials" and "Processes". The extensive Material Selection Guide" and a "Material Database" guides the reader through the selection of appropriate materials for the required task at hand. The "Processes" section of the book is organized as a catalog of various microfabrication processes, each with a brief introduction to the technology, as well as examples of common uses in MEMs.

Life Cycle Assessment of Semiconductors

Life Cycle Assessment of Semiconductors Book
Author : Sarah B. Boyd
Publisher : Springer Science & Business Media
Release : 2011-10-12
ISBN : 9781441999887
Language : En, Es, Fr & De

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Book Description :

Life-Cycle Assessment of Semiconductors presents the first and thus far only available transparent and complete life cycle assessment of semiconductor devices. A lack of reliable semiconductor LCA data has been a major challenge to evaluation of the potential environmental benefits of information technologies (IT). The analysis and results presented in this book will allow a higher degree of confidence and certainty in decisions concerning the use of IT in efforts to reduce climate change and other environmental effects. Coverage includes but is not limited to semiconductor manufacturing trends by product type and geography, unique coverage of life-cycle assessment, with a focus on uncertainty and sensitivity analysis of energy and global warming missions for CMOS logic devices, life cycle assessment of flash memory and life cycle assessment of DRAM. The information and conclusions discussed here will be highly relevant and useful to individuals and institutions.

Advanced Interconnects for ULSI Technology

Advanced Interconnects for ULSI Technology Book
Author : Mikhail Baklanov,Paul S. Ho,Ehrenfried Zschech
Publisher : John Wiley & Sons
Release : 2012-02-17
ISBN : 1119966868
Language : En, Es, Fr & De

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Book Description :

Finding new materials for copper/low-k interconnects is critical to the continuing development of computer chips. While copper/low-k interconnects have served well, allowing for the creation of Ultra Large Scale Integration (ULSI) devices which combine over a billion transistors onto a single chip, the increased resistance and RC-delay at the smaller scale has become a significant factor affecting chip performance. Advanced Interconnects for ULSI Technology is dedicated to the materials and methods which might be suitable replacements. It covers a broad range of topics, from physical principles to design, fabrication, characterization, and application of new materials for nano-interconnects, and discusses: Interconnect functions, characterisations, electrical properties and wiring requirements Low-k materials: fundamentals, advances and mechanical properties Conductive layers and barriers Integration and reliability including mechanical reliability, electromigration and electrical breakdown New approaches including 3D, optical, wireless interchip, and carbon-based interconnects Intended for postgraduate students and researchers, in academia and industry, this book provides a critical overview of the enabling technology at the heart of the future development of computer chips.

Handbook of Semiconductor Interconnection Technology

Handbook of Semiconductor Interconnection Technology Book
Author : Geraldine Cogin Shwartz
Publisher : CRC Press
Release : 2006-02-22
ISBN : 1420017659
Language : En, Es, Fr & De

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Book Description :

First introduced about a decade ago, the first edition of the Handbook of Semiconductor Interconnection Technology became widely popular for its thorough, integrated treatment of interconnect technologies and its forward-looking perspective. The field has grown tremendously in the interim and many of the "likely directions" outlined in the first ed

Analysis of Machining and Machine Tools

Analysis of Machining and Machine Tools Book
Author : Steven Liang,Albert J. Shih
Publisher : Springer
Release : 2015-12-29
ISBN : 1489976450
Language : En, Es, Fr & De

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Book Description :

This book provides readers with the fundamental, analytical, and quantitative knowledge of machining process planning and optimization based on advanced and practical understanding of machinery, mechanics, accuracy, dynamics, monitoring techniques, and control strategies that they need to understanding machining and machine tools. It is written for first-year graduate students in mechanical engineering, and is also appropriate for use as a reference book by practicing engineers. It covers topics such as single and multiple point cutting processes; grinding processes; machine tool components, accuracy, and metrology; shear stress in cutting, cutting temperature and thermal analysis, and machine tool chatter. The second section of the book is devoted to “Non-Traditional Machining,” where readers can find chapters on electrical discharge machining, electrochemical machining, laser and electron beam machining, and biomedical machining. Examples of realistic problems that engineers are likely to face in the field are included, along with solutions and explanations that foster a didactic learning experience.

Microelectronic Packaging

Microelectronic Packaging Book
Author : M. Datta,Tetsuya Osaka,J. Walter Schultze
Publisher : CRC Press
Release : 2004-12-20
ISBN : 020347368X
Language : En, Es, Fr & De

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Book Description :

Microelectronic Packaging analyzes the massive impact of electrochemical technologies on various levels of microelectronic packaging. Traditionally, interconnections within a chip were considered outside the realm of packaging technologies, but this book emphasizes the importance of chip wiring as a key aspect of microelectronic packaging, and focuses on electrochemical processing as an enabler of advanced chip metallization. Divided into five parts, the book begins by outlining the basics of electrochemical processing, defining the microelectronic packaging hierarchy, and emphasizing the impact of electrochemical technology on packaging. The second part discusses chip metallization topics including the development of robust barrier layers and alternative metallization materials. Part III explores key aspects of chip-package interconnect technologies, followed by Part IV's analysis of packages, boards, and connectors which covers materials development, technology trends in ceramic packages and multi-chip modules, and electroplated contact materials. Illustrating the importance of processing tools in enabling technology development, the book concludes with chapters on chemical mechanical planarization, electroplating, and wet etching/cleaning tools. Experts from industry, universities, and national laboratories submitted reviews on each of these subjects, capturing the technological advances made in each area. A detailed examination of how packaging responds to the challenges of Moore's law, this book serves as a timely and valuable reference for microelectronic packaging and processing professionals and other industrial technologists.

Precision Manufacturing

Precision Manufacturing Book
Author : David A. Dornfeld,Dae-Eun Lee
Publisher : Springer Science & Business Media
Release : 2007-11-22
ISBN : 0387682082
Language : En, Es, Fr & De

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Book Description :

Precision Manufacturing provides an introduction to precision engineering for manufacturing. With an emphasis on design and performance of precision machinery for manufacturing – machine tool elements and structure, sources of error, precision machining processes and process models sensors for process monitoring and control, metrology, actuators, and machine design. This book will be of interest to design engineers, quality engineers and manufacturing engineers, academics and those who may or may not have previous experience with precision manufacturing, but want to learn more.

Research on Chemical Mechanical Polishing Mechanism of Novel Diffusion Barrier Ru for Cu Interconnect

Research on Chemical Mechanical Polishing Mechanism of Novel Diffusion Barrier Ru for Cu Interconnect Book
Author : Jie Cheng
Publisher : Springer
Release : 2017-09-06
ISBN : 9811061653
Language : En, Es, Fr & De

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Book Description :

This thesis addresses selected unsolved problems in the chemical mechanical polishing process (CMP) for integrated circuits using ruthenium (Ru) as a novel barrier layer material. Pursuing a systematic approach to resolve the remaining critical issues in the CMP, it first investigates the tribocorrosion properties and the material removal mechanisms of copper (Cu) and Ru in KIO4-based slurry. The thesis subsequently studies Cu/Ru galvanic corrosion from a new micro and in-situ perspective, and on this basis, seeks ways to mitigate corrosion using different slurry additives. The findings presented here constitute a significant advance in fundamental and technical investigations into the CMP, while also laying the groundwork for future research.

Wafer Manufacturing Shaping of Single Crystal Silicon Wafers

Wafer Manufacturing  Shaping of Single Crystal Silicon Wafers Book
Author : Imin Cao,Milind Bhagavat
Publisher : John Wiley & Sons
Release : 2021-03-22
ISBN : 0470061219
Language : En, Es, Fr & De

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Book Description :

Presenting all the major stages in wafer manufacturing, from crystals to prime wafers. This book first outlines the physics, associated metrology, process modelling and quality requirements and the goes on to discuss wafer forming and wafer surface preparation techniques. The whole is rounded off with a chapter on the research and future challenges in wafer manufacturing.

Advances in Abrasive Based Machining and Finishing Processes

Advances in Abrasive Based Machining and Finishing Processes Book
Author : S. Das,G. Kibria,B. Doloi,B. Bhattacharyya
Publisher : Springer Nature
Release : 2020-05-10
ISBN : 3030433129
Language : En, Es, Fr & De

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Book Description :

This book presents the advances in abrasive based machining and finishing in broad sense. Specifically, the book covers the novel machining and finishing strategies implemented in various advanced machining processes for improving machining accuracy and overall quality of the product. This book presents the capability of advanced machining processes using abrasive grain. It also covers ways for enhancing the production rate as well as quality. It fulfills the gap between the production of any complicated components and successful machining with abrasive particles.

Advances in Tribology

Advances in Tribology Book
Author : Pranav H. Darji
Publisher : Unknown
Release : 2016-10-26
ISBN : 953512742X
Language : En, Es, Fr & De

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Book Description :

Download Advances in Tribology book written by Pranav H. Darji, available in PDF, EPUB, and Kindle, or read full book online anywhere and anytime. Compatible with any devices.